Influence of evaporation rate on optical constants of ITO deposited by e-beam evaporation - 文章详情页

作者：

Li, Tian-Lin (Li, Tian-Lin.) | Zhu, Yan-Xu (Zhu, Yan-Xu.) | Xu, Chen (Xu, Chen.) (学者：徐晨) | Gao, Guo (Gao, Guo.) | Shen, Guang-Di (Shen, Guang-Di.)

收录：

EI Scopus PKU CSCD

摘要：

Due　to　its　complicated　microstructure　and　absorption　mechanism,　it＇s　difficult　to　measuring　optical　constants　of　ITO.　In　this　paper,　variable　angle　of　incidence　spectroscopic　ellipsometry　(VASE)　was　employed　to　measure　the　ellipsometric　parameters　of　ITO.　A　simple　but　appropriate　model　was　established　to　fit　experiment　data　of　ITO　in　visible　spectrum.　Based　on　the　fitting　result　of　VASE,　the　influence　of　evaporation　rate　on　optical　constants　of　ITO　deposited　by　e-beam　evaporation　was　investigated.　The　result　showed　refractive　index　and　extinction　coefficient　increased　with　evaporation　rate　of　ITO.　On　the　basis　of　Hall　effect,　carrier　concentrations　of　ITO　under　different　evaporation　rate　were　measured.　This　result　showed　it　was　reasonable　that　optical　constants　of　ITO　increase　with　evaporation　rate.

关键词：

Ellipsometry Rate constants Refractive index Spectroscopic ellipsometry Evaporation Optical constants

作者机构：

[ 1 ] [Li, Tian-Lin]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
[ 2 ] [Zhu, Yan-Xu]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
[ 3 ] [Xu, Chen]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
[ 4 ] [Gao, Guo]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
[ 5 ] [Shen, Guang-Di]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China

通讯作者信息：

电子邮件地址：

查看成果更多字段

成果类型
所属机构

所有年份指定年份从至