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Within the limit of fabricating techniques, 2000 l/mm self-standing transmission gratings model was designed. And by combining the techniques of electronic-beam lithography and X-ray lithography, the 2000 l/mm X-ray self-standing transmission gratings was fabricated. Firstly, the electronic-beam lithography and micro-electroplating technology was used to prepare a master mask of gratings on polyimide membrane substrate. Then by using X-ray lithography and micro-electroplating, child gratings was replicated on the master mask. And the self-standing graph was transferred to the daughter gratings via utraviolet (U-V) lithography and micro-electroplating. Finally, with the technology of etching and inductively coupled plasma (ICP), the fabrication of X-ray self-standing transmission gratings was fulfilled. From the fabrication results of the gratings, it shows that bars smoothness, the absent ratio and the profile of the gratings are all desired.
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