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摘要:
This paper researches the influence of different anneal temperature to the reflectivity of the Al/SiO2, Al/ITO, Au/SiO2 Au/ITO ODR corresponding to the wavelength of 400 nm-800 nm. It is proposed that, in the wavelength of 460 nm, the reflectivity is down to minimum when the anneal temperature of Al/SiO2 reflector is 500-700 K, and when temperature above 700C, it is back to normal and increase a little; the one of Al/ITO decreases monotonic with the increasing temperature, and Ti/A/Ti/Au structure is applied to improve the characteristic of the reflector. Moreover, it is also noted that, in the wavelength of 620 nm, reflectivity of Au/SiO2 and Au/ITO both achieve the maximum with the anneal temperature of 700 K, and the performance of Au/SiO2 ODR is superior to that of Au/ITO. We validates the conclusion with the experiment and analysis the cause of the variation of the reflectivity.
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来源 :
Research and Progress of Solid State Electronics
ISSN: 1000-3819
年份: 2008
期: 3
卷: 28
页码: 396-399
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