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作者:

Zheng, Xiang (Zheng, Xiang.) | Feng, Shiwei (Feng, Shiwei.) (学者:冯士维) | Peng, Chao (Peng, Chao.) | Lin, Gang (Lin, Gang.) | Bai, Lin (Bai, Lin.) | Li, Xuan (Li, Xuan.) | Yang, Ying (Yang, Ying.) | Pan, Shijie (Pan, Shijie.) | Hu, Zhaoxu (Hu, Zhaoxu.) | Li, Xiaoyang (Li, Xiaoyang.) (学者:李晓阳) | Zhang, Yamin (Zhang, Yamin.)

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EI Scopus SCIE

摘要:

Theeffects of gamma rays on two kinds of GaN high-electron-mobility transistors (HEMTs) have been investigated in this paper. We have identified a gate degradation using a combination of optical and electrical measurements. We have demonstrated that the channel current under the degradation position is outside of the gate's control. This degradation prevents the gate from fully pinching off the channel, creating a current concentration region when applying a reverse gate voltage. An integrated analysis, including I-V characterization, the emission microscope (EMMI) technique, and temperature-dependent measurements, was applied to study its mechanism. It is attributed to an irradiation-induced degradation in the Schottky contact.

关键词:

Gamma irradiation GaN gate degradation high-electron-mobility transistors (HEMTs) subthreshold current

作者机构:

  • [ 1 ] [Zheng, Xiang]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 2 ] [Feng, Shiwei]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 3 ] [Li, Xuan]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 4 ] [Yang, Ying]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 5 ] [Pan, Shijie]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 6 ] [Hu, Zhaoxu]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 7 ] [Li, Xiaoyang]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 8 ] [Zhang, Yamin]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 9 ] [Peng, Chao]China Elect Prod Reliabil & Environm Testing Res, Sci & Technol Reliabil Phys & Applicat Elect Comp, Guangzhou 510610, Guangdong, Peoples R China
  • [ 10 ] [Lin, Gang]Key Lab Microwave & Millimeter Wave Monolith Inte, Nanjing 100048, Jiangsu, Peoples R China
  • [ 11 ] [Bai, Lin]Nanjing Elect Devices Inst, Nanjing 210016, Jiangsu, Peoples R China

通讯作者信息:

  • 冯士维

    [Feng, Shiwei]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China;;[Zhang, Yamin]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China

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相关关键词:

来源 :

IEEE TRANSACTIONS ON ELECTRON DEVICES

ISSN: 0018-9383

年份: 2019

期: 9

卷: 66

页码: 3784-3788

3 . 1 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:52

JCR分区:2

被引次数:

WoS核心集被引频次: 10

SCOPUS被引频次: 11

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

近30日浏览量: 4

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