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作者:

Niu, Nan-Hui (Niu, Nan-Hui.) | Wang, Huai-Bing (Wang, Huai-Bing.) | Liu, Jian-Ping (Liu, Jian-Ping.) | Liu, Nai-Xin (Liu, Nai-Xin.) | Xing, Yan-Hui (Xing, Yan-Hui.) | Han, Jun (Han, Jun.) | Deng, Jun (Deng, Jun.) | Shen, Guang-Di (Shen, Guang-Di.)

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摘要:

InGaN/GaN MQWs structures were grown by MOCVD. The effects of the growth interruption time on the optical and structural properties of InGaN/GaN MQWs were investigated. The growth interruption can improve the interface quality, increase the intensity of photoluminescence (PL) and electroluminescence (EL); but if the interruption time was too long, the well thickness and the average in composition of MQWs decreased, and the EL intensity also decreased due to poor interface quality and impurity derived by growth interruption.

关键词:

Electroluminescence Gallium nitride Growth (materials) Metallorganic chemical vapor deposition Optical properties Photoluminescence Semiconductor quantum wells Structural properties X ray diffraction analysis

作者机构:

  • [ 1 ] [Niu, Nan-Hui]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
  • [ 2 ] [Wang, Huai-Bing]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
  • [ 3 ] [Liu, Jian-Ping]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
  • [ 4 ] [Liu, Nai-Xin]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
  • [ 5 ] [Xing, Yan-Hui]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
  • [ 6 ] [Han, Jun]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
  • [ 7 ] [Deng, Jun]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
  • [ 8 ] [Shen, Guang-Di]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China

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来源 :

Journal of Optoelectronics Laser

ISSN: 1005-0086

年份: 2007

期: 4

卷: 18

页码: 422-424

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