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摘要:
In this paper, we simulate the relationship between the reflectivity and the light incident angle. When the incident angle is more than 23°, the light can not be extracted from LED top emitting surface. We fabricate SiON and SiNx films respectively at low temperature (100 °C) through Plasma Enhanced Chemical Vapor Deposition (PECVD) to serve as the passivation layer of GaN-LEDs, and then compare their light output power. The light output power of the LED improved greatly after depositing the SiON passivation layer.
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来源 :
Research and Progress of Solid State Electronics
ISSN: 1000-3819
年份: 2007
期: 4
卷: 27
页码: 558-561
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