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作者:

Da, Xiaoli (Da, Xiaoli.) | Shen, Guangdi (Shen, Guangdi.) | Xu, Chen (Xu, Chen.) (学者:徐晨) | Zhu, Yanxu (Zhu, Yanxu.)

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摘要:

In this paper, we simulate the relationship between the reflectivity and the light incident angle. When the incident angle is more than 23°, the light can not be extracted from LED top emitting surface. We fabricate SiON and SiNx films respectively at low temperature (100 °C) through Plasma Enhanced Chemical Vapor Deposition (PECVD) to serve as the passivation layer of GaN-LEDs, and then compare their light output power. The light output power of the LED improved greatly after depositing the SiON passivation layer.

关键词:

Gallium nitride Light emitting diodes Light reflection Passivation Plasma enhanced chemical vapor deposition

作者机构:

  • [ 1 ] [Da, Xiaoli]Optoelectronic Technology Lab., Institute of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 2 ] [Shen, Guangdi]Optoelectronic Technology Lab., Institute of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 3 ] [Xu, Chen]Optoelectronic Technology Lab., Institute of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 4 ] [Zhu, Yanxu]Optoelectronic Technology Lab., Institute of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100022, China

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来源 :

Research and Progress of Solid State Electronics

ISSN: 1000-3819

年份: 2007

期: 4

卷: 27

页码: 558-561

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WoS核心集被引频次: 0

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