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摘要:
The undoped GaN films were grown on mis-cut sapphire substrates with different angle (0-0.3°) by MOCVD. Samples were investigated by microscopy, double crystal X-ray diffractometry (DCXRD), photoluminescence (PL), hall technique to character their morphological, crystal properties. The results revealed that the dislocation density of the GaN films decreased by using a suitable angle of mis-cut sapphire substrate. With an angle of 0.2°, the best surface morphological and crystal quality of the GaN films can be obtained.
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来源 :
Journal of Functional Materials
ISSN: 1001-9731
年份: 2006
期: 12
卷: 37
页码: 1914-1916
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