Preparation of shaped tungsten product by chemical vapor deposition - 文章详情页

作者：

Ma, Jie (Ma, Jie.) | Zhang, Hao-Dong (Zhang, Hao-Dong.) | Bi, An-Yuan (Bi, An-Yuan.) | Wang, Cong-Zeng (Wang, Cong-Zeng.) | Zhou, Mei-Ling (Zhou, Mei-Ling.)

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摘要：

Using　WF6　and　H2　as　precursors,　many　kinds　of　dense　shaped　tungsten　products　were　successfully　developed　by　chemical　vapor　deposition.　The　results　show　that　the　deposit　is　of　high　purity　(＞99.8%)　and　high　density　(＞19.2　g/cm3).　The　microstructure　of　deposit　is　columnar　crystal　with　preferential　growth　in　the　direction　of　(200).　The　deposition　rate　can　be　2-3　mm/h.　The　application　of　chemical　vapor　deposition　method　in　preparing　shaped　tungsten　product　possesses　a　bright　future　due　to　simple　equipment,　reliable　process　and　the　product　of　high　quality.

关键词：

Synthesis (chemical) Crystals Microstructure Reliability Quality control Density (specific gravity) Tungsten Chemical vapor deposition

作者机构：

[ 1 ] [Ma, Jie]Key Laboratory of Advanced Functional Materials, Beijing University of Technology, Beijing 100022, China
[ 2 ] [Zhang, Hao-Dong]Key Laboratory of Advanced Functional Materials, Beijing University of Technology, Beijing 100022, China
[ 3 ] [Bi, An-Yuan]Key Laboratory of Advanced Functional Materials, Beijing University of Technology, Beijing 100022, China
[ 4 ] [Wang, Cong-Zeng]Key Laboratory of Advanced Functional Materials, Beijing University of Technology, Beijing 100022, China
[ 5 ] [Zhou, Mei-Ling]Key Laboratory of Advanced Functional Materials, Beijing University of Technology, Beijing 100022, China

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