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作者:

Niu, Nanhui (Niu, Nanhui.) | Wang, Huaibing (Wang, Huaibing.) | Liu, Jianping (Liu, Jianping.) | Liu, Naixin (Liu, Naixin.) | Xing, Yanhui (Xing, Yanhui.) | Han, Jun (Han, Jun.) | Deng, Jun (Deng, Jun.) | Shen, Guangdi (Shen, Guangdi.)

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摘要:

P-GaN films were grown by MOCVD with various flow rates of Mg. Crystallography and electrical properties of these P-GaN films were characterized by Hall technique and double crystal X-ray diffractometry (DCXRD). The relation between the Mg flow rate and the property of P-GaN films was discussed. We found that low flow rate of Mg led to low hole concentration and poor electrical property, but high flow rate of Mg made the situation even worse. As the Mg flow rate increases, the surface morphology and crystallinity of the films become rough and worse due to more micro defects generated by doping Mg, the activation rate of Mg decreases, and the self-compensation effects is enhanced. The LED structure was grown using the optimum Mg flow rate. With 20 mA current injection, the output power of the LED (460 nm) was 6.5 mW, the Vf and Vr were 3.3 and 20 V, respectively.

关键词:

Crystallography Crystals Doping (additives) Films Gallium nitride Light emitting diodes Magnesium printing plates Metallorganic chemical vapor deposition Morphology X rays

作者机构:

  • [ 1 ] [Niu, Nanhui]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
  • [ 2 ] [Wang, Huaibing]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
  • [ 3 ] [Liu, Jianping]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
  • [ 4 ] [Liu, Naixin]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
  • [ 5 ] [Xing, Yanhui]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
  • [ 6 ] [Han, Jun]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
  • [ 7 ] [Deng, Jun]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China
  • [ 8 ] [Shen, Guangdi]Beijing Optoelectronic Technology Laboratory, Institute of Information, Beijing University of Technology, Beijing 100022, China

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来源 :

Research and Progress of Solid State Electronics

ISSN: 1000-3819

年份: 2006

期: 3

卷: 26

页码: 375-378

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