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作者:

Gai, Hong-Xing (Gai, Hong-Xing.) | Chen, Jian-Xin (Chen, Jian-Xin.) | Deng, Jun (Deng, Jun.) | Lian, Peng (Lian, Peng.) | Yu, Bo (Yu, Bo.) | Li, Jian-Jun (Li, Jian-Jun.) | Han, Jun (Han, Jun.) | Shen, Guang-Di (Shen, Guang-Di.)

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摘要:

For a vertical-cavity surface-emitting laser (VCSEL), the epilayer thickness accuracy is very important. The influence of the thickness deviation on the reflection spectrum of semiconductor materials DBR was analyzed using the transfer matrix method. By the influence, a determining method of the thickness of the DBR grown by MOCVD was presented. Based on the approach, the 980 nmVCSEL wafer was grown by MOCVD, in which center wavelength of the VCSEL reflection spectrum is 982 nm. The results show that the method can be used in verifying the thickness of the epitaxy materials and growth parameters of the MOCVD and provide the reliable information for the VCSEL growth.

关键词:

Epitaxial growth Metallorganic chemical vapor deposition Mirrors Optical films Reflection Semiconductor materials Thickness measurement Thin films

作者机构:

  • [ 1 ] [Gai, Hong-Xing]Beijing Optoelectronic Technology Laboratory, Department of Electrical Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 2 ] [Chen, Jian-Xin]Beijing Optoelectronic Technology Laboratory, Department of Electrical Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 3 ] [Deng, Jun]Beijing Optoelectronic Technology Laboratory, Department of Electrical Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 4 ] [Lian, Peng]Beijing Optoelectronic Technology Laboratory, Department of Electrical Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 5 ] [Yu, Bo]Beijing Optoelectronic Technology Laboratory, Department of Electrical Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 6 ] [Li, Jian-Jun]Beijing Optoelectronic Technology Laboratory, Department of Electrical Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 7 ] [Han, Jun]Beijing Optoelectronic Technology Laboratory, Department of Electrical Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 8 ] [Shen, Guang-Di]Beijing Optoelectronic Technology Laboratory, Department of Electrical Engineering, Beijing University of Technology, Beijing 100022, China

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来源 :

Optics and Precision Engineering

ISSN: 1004-924X

年份: 2006

期: 1

卷: 14

页码: 54-57

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