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作者:

Han, Weina (Han, Weina.) | Li, Dongfang (Li, Dongfang.) | Liu, Furong (Liu, Furong.) (学者:刘富荣) | Yuan, Yanping (Yuan, Yanping.) | Li, Xiaowei (Li, Xiaowei.)

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SCIE

摘要:

We demonstrate the feasibility to control the confined electromagnetic field by surface plasmon poloritons (SPPs) excitation and scattering modulation based on the pre-processed Au nanostructures under the irradiation of single-shot femtosecond (fs) laser pulse, and then to control the surface tension-induced molten Si transport due to the directed lateral temperature profile, thus resulting in the formation of Si nanostructures. Annular-shaped fs laser pulse is employed based on nonlinear optical effect of frequency-doubling process to imprint Au planar nanostructures with various morphologies. Because surface plasmon polaritons can be easily excited and controlled on planar nanostructures of noble metals, the localized electromagnetic field can be effectively modulated by controlling the metallic nanostructures. Thus, the quasi-plasmonic Au nanostructures act as precursors for controlling the subsequent electromagnetic field by fs laser irradiation. Upon irradiation of pre-processed Au nanostructures, confined electromagnetic field induces a specific surface tension profile, causing directional transport of molten Si. After solidification, Si nanostructures of controllable morphologies can be fabricated. Simulation results are in agreement with the theoretical mechanism. Moreover, further optimized modulation of nanodome can be achieved by controlling the focus spot control combined with the polarization state control. This paper provides an effective method for enabling a scalable formation of Si nanostructures.

关键词:

Annular-shaped femtosecond laser planar metallic nanostructure Si nanostructures surface plasmon polaritons

作者机构:

  • [ 1 ] [Han, Weina]Beijing Inst Technol, Sch Mech Engn, Laser Micro Nano Fabricat Lab, Beijing 100081, Peoples R China
  • [ 2 ] [Li, Xiaowei]Beijing Inst Technol, Sch Mech Engn, Laser Micro Nano Fabricat Lab, Beijing 100081, Peoples R China
  • [ 3 ] [Han, Weina]Beijing Univ Technol, Beijing Engn Res Ctr Appl Laser Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Li, Dongfang]Beijing Univ Technol, Beijing Engn Res Ctr Appl Laser Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Liu, Furong]Beijing Univ Technol, Beijing Engn Res Ctr Appl Laser Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 6 ] [Yuan, Yanping]Beijing Univ Technol, Beijing Engn Res Ctr Appl Laser Technol, Inst Laser Engn, Beijing 100124, Peoples R China

通讯作者信息:

  • [Yuan, Yanping]Beijing Univ Technol, Beijing Engn Res Ctr Appl Laser Technol, Inst Laser Engn, Beijing 100124, Peoples R China

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来源 :

IEEE PHOTONICS JOURNAL

ISSN: 1943-0655

年份: 2019

期: 4

卷: 11

2 . 4 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:50

JCR分区:2

被引次数:

WoS核心集被引频次: 3

SCOPUS被引频次:

ESI高被引论文在榜: 0 展开所有

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