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作者:

Cao, Yulian (Cao, Yulian.) | Lian, Peng (Lian, Peng.) | Wang, Qing (Wang, Qing.) | Wu, Xuming (Wu, Xuming.) | He, Guorong (He, Guorong.) | Cao, Qing (Cao, Qing.) | Song, Guofeng (Song, Guofeng.) | Chen, Lianghui (Chen, Lianghui.)

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摘要:

Using metal organic chemical vapor deposition, we fabricate an InGaAsP/InGaP/AlGaAs single quantum well laser with a separate confinement heterostructure. We calculate the gain spectrum with and without the effect of interband relaxation. The peak wavelength of the PL spectrum is 764 nm. Due to the In carry-over effect, the interface between InGaP and AlGaAs is not abrupt. The performance of the laser diodes into which a thin GaAsP interlayer is inserted is better than those with no such interlayer. The threshold current is decreased from 560 to 450 mA, the slope efficiency is increased from 0.61 to 0.7 W/A, and the output power is increased from 370 to 940 mW.

关键词:

Heterojunctions High power lasers Interfaces (materials) Metallorganic chemical vapor deposition Photoluminescence Quantum well lasers Semiconductor lasers

作者机构:

  • [ 1 ] [Cao, Yulian]Nano-Optoelectronics Laboratory, Institute of Semiconductors, Chinese Acad. of Sci., Beijing 100083, China
  • [ 2 ] [Lian, Peng]Department of Electronic Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 3 ] [Wang, Qing]Nano-Optoelectronics Laboratory, Institute of Semiconductors, Chinese Acad. of Sci., Beijing 100083, China
  • [ 4 ] [Wu, Xuming]Nano-Optoelectronics Laboratory, Institute of Semiconductors, Chinese Acad. of Sci., Beijing 100083, China
  • [ 5 ] [He, Guorong]Nano-Optoelectronics Laboratory, Institute of Semiconductors, Chinese Acad. of Sci., Beijing 100083, China
  • [ 6 ] [Cao, Qing]Nano-Optoelectronics Laboratory, Institute of Semiconductors, Chinese Acad. of Sci., Beijing 100083, China
  • [ 7 ] [Song, Guofeng]Nano-Optoelectronics Laboratory, Institute of Semiconductors, Chinese Acad. of Sci., Beijing 100083, China
  • [ 8 ] [Chen, Lianghui]Nano-Optoelectronics Laboratory, Institute of Semiconductors, Chinese Acad. of Sci., Beijing 100083, China

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来源 :

Chinese Journal of Semiconductors

ISSN: 0253-4177

年份: 2006

期: 9

卷: 27

页码: 1621-1624

被引次数:

WoS核心集被引频次: 0

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ESI高被引论文在榜: 0 展开所有

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