Mo-W　alloy　coating　were　grown　on　copper　substrates　by　chemical　vapor　deposition　(CVD)　with　a　mixture　MoF6,　WF6　and　H2　as　the　gaseous　source.　The　films　were　characterized　with　X-ray　diffraction　and　metalloscopy.　The　results　show　that　the　films　are　homogenous,　monophased　solid　solution　of　Mo　and　W;　fine　equiaxial　grains　exist　at　the　lamellar　crystal　boundaries　in　a　Mo　rich　samples　whereas　columnar　grains　dominate　in　a　W-rich　sample.　The　composition　of　Mo　and　W　can　be　controlled　by　varying　the　ratio　of　MoF6　and　WF6　partial　pressures.　The　strengths　of　refractory　metal　alloy　film　grown　by　CVD,　say　Mo-W　coating,　include　high　purity,　simple　equipment　and　fast　film　growth　rate.