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作者:

Hu, Dongqing (Hu, Dongqing.) | Luo, Xiaokang (Luo, Xiaokang.) | Zhou, Xintian (Zhou, Xintian.)

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EI

摘要:

Depletion-mode gallium nitride (GaN) high-electron-mobility transistors (HEMTs) need to connect with an enhancement-mode silicon (Si) MOSFET for cascoded structures in order to achieve normally-off operation. The devices are submitted to electrical overstress to investigate the degradation phenomenon. The results demonstrate that degradation near the rated voltage of enhancement-mode GaN (e-GaN) Cascoded FETs can be a time-dependent process. There is no significant degradation of on-resistance and saturation current after a period of time for devices experienced 320V stress. The electrical characteristics of the devices are measured after 6 days of natural recovery. The on-resistance and saturation current of all devices exhibit reversibility, while the gate/source leakage current is irreversible. © 2019 IEEE.

关键词:

Analog circuits Gallium nitride High electron mobility transistors III-V semiconductors Nitrides

作者机构:

  • [ 1 ] [Hu, Dongqing]Beijing University of Technology, Beijing, China
  • [ 2 ] [Luo, Xiaokang]Beijing University of Technology, Beijing, China
  • [ 3 ] [Zhou, Xintian]Beijing University of Technology, Beijing, China

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年份: 2019

页码: 157-160

语种: 英文

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WoS核心集被引频次: 0

SCOPUS被引频次: 2

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