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作者:

Song, Xubo (Song, Xubo.) | Wang, Yuangang (Wang, Yuangang.) | Feng, Zhihong (Feng, Zhihong.) | Lv, Yuanjie (Lv, Yuanjie.) | Zhang, Yamin (Zhang, Yamin.) | Zhang, Lisen (Zhang, Lisen.) | Liang, Shixiong (Liang, Shixiong.) | Tan, Xin (Tan, Xin.) | Dun, Shaobo (Dun, Shaobo.) | Yang, Dabao (Yang, Dabao.) | Zhang, Zhirong (Zhang, Zhirong.)

收录:

EI

摘要:

We presented a GaN Schottky diode model with consideration of self-heating effect of devices in operation. The impact of diode chip temperature on the current and capacitance was taken into account in this model. The thermal resistance of diode chip was extracted by simulation combined measurement to calculate the temperature of Schottky junction with different pumping power. Advantages of established device model in the design of a 220GHz frequency doubler were presented in the end. © 2019 IEEE.

关键词:

Diodes Gallium nitride III-V semiconductors Models Schottky barrier diodes

作者机构:

  • [ 1 ] [Song, Xubo]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 2 ] [Wang, Yuangang]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 3 ] [Feng, Zhihong]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 4 ] [Lv, Yuanjie]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 5 ] [Zhang, Yamin]Laboratory of Semiconductor Device Reliability Physics, Beijing University of Technology, Beijing, China
  • [ 6 ] [Zhang, Lisen]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 7 ] [Liang, Shixiong]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 8 ] [Tan, Xin]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 9 ] [Dun, Shaobo]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 10 ] [Yang, Dabao]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China
  • [ 11 ] [Zhang, Zhirong]National Key Laboratory of ASIC, Hebei Semiconductor Research Institude, Shijiazhuang, China

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ISSN: 2162-7541

年份: 2019

语种: 英文

被引次数:

WoS核心集被引频次: 0

SCOPUS被引频次: 2

ESI高被引论文在榜: 0 展开所有

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近30日浏览量: 2

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