• 综合
  • 标题
  • 关键词
  • 摘要
  • 学者
  • 期刊-刊名
  • 期刊-ISSN
  • 会议名称
搜索

作者:

Dong, Xiaoqiao (Dong, Xiaoqiao.) | Yang, Yuancheng (Yang, Yuancheng.) | Chen, Gong (Chen, Gong.) | Sun, Shuang (Sun, Shuang.) | Cai, Qifeng (Cai, Qifeng.) | Li, Xiaokang (Li, Xiaokang.) | An, Xia (An, Xia.) | Xu, Xiaoyan (Xu, Xiaoyan.) | Zhang, Wanrong (Zhang, Wanrong.) | Li, Ming (Li, Ming.)

收录:

EI Scopus

摘要:

In this paper, an analytical model is developed for parasitic gate capacitance of the gate-all-around (GAA) silicon nanowire MOSFETs (SNWT) with asymmetrical top and bottom gates. The modeling results show that the gate-to-source/drain spacer significantly impacts on the parasitic capacitance especially in the case of top-to-bottom gate misalignment. It is found that the optimized top-to-bottom gate misalignment may achieve smaller Cp/Ctotal so as to improve the AC performance of GAA SNWT. The developed capacitance model is more suitable for the actual process for further device design optimization. © 2018 IEEE.

关键词:

Alignment Capacitance Integrated circuits MOSFET devices Nanowires Silicon

作者机构:

  • [ 1 ] [Dong, Xiaoqiao]Faculty of Information Technology, Beijing University of Technology, Beijing; 100124, China
  • [ 2 ] [Dong, Xiaoqiao]Key Laboratory of Microelectronic Devices and Circuits, Institute of Microelectronics, Peking University, Beijing; 100871, China
  • [ 3 ] [Yang, Yuancheng]Key Laboratory of Microelectronic Devices and Circuits, Institute of Microelectronics, Peking University, Beijing; 100871, China
  • [ 4 ] [Chen, Gong]Key Laboratory of Microelectronic Devices and Circuits, Institute of Microelectronics, Peking University, Beijing; 100871, China
  • [ 5 ] [Sun, Shuang]Key Laboratory of Microelectronic Devices and Circuits, Institute of Microelectronics, Peking University, Beijing; 100871, China
  • [ 6 ] [Cai, Qifeng]Key Laboratory of Microelectronic Devices and Circuits, Institute of Microelectronics, Peking University, Beijing; 100871, China
  • [ 7 ] [Li, Xiaokang]Key Laboratory of Microelectronic Devices and Circuits, Institute of Microelectronics, Peking University, Beijing; 100871, China
  • [ 8 ] [An, Xia]Key Laboratory of Microelectronic Devices and Circuits, Institute of Microelectronics, Peking University, Beijing; 100871, China
  • [ 9 ] [Xu, Xiaoyan]Key Laboratory of Microelectronic Devices and Circuits, Institute of Microelectronics, Peking University, Beijing; 100871, China
  • [ 10 ] [Zhang, Wanrong]Key Laboratory of Microelectronic Devices and Circuits, Institute of Microelectronics, Peking University, Beijing; 100871, China
  • [ 11 ] [Li, Ming]Key Laboratory of Microelectronic Devices and Circuits, Institute of Microelectronics, Peking University, Beijing; 100871, China

通讯作者信息:

电子邮件地址:

查看成果更多字段

相关关键词:

相关文章:

来源 :

年份: 2018

语种: 英文

被引次数:

WoS核心集被引频次: 0

SCOPUS被引频次: 3

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

近30日浏览量: 2

归属院系:

在线人数/总访问数:651/2898206
地址:北京工业大学图书馆(北京市朝阳区平乐园100号 邮编:100124) 联系我们:010-67392185
版权所有:北京工业大学图书馆 站点建设与维护:北京爱琴海乐之技术有限公司