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作者:

Gao, Li (Gao, Li.) | Guo, Chunsheng (Guo, Chunsheng.) | Li, Shiwei (Li, Shiwei.)

收录:

EI Scopus

摘要:

In this study, the maximum spatial resolution of infrared thermal imager is 3 μm, and the gate length of AlGaN/GaN HEMTs is between 0.2 μm and 1 μm. Therefore, the infrared thermal imaging instrument measurement results are only an average temperature that is lower than the actual temperature. By combining infrared thermal imaging with Sentaurus TCAD simulation, the junction temperature of AlGaN/GaN HEMTs can be accurately measured. First, with the infrared thermal imager under different loading power settings and the shell temperature of the AlGaN/GaN HEMT junction temperature increase, the Sentaurus TCAD of AlGaN/GaN HEMTs for steady-state and transient simulations is measured. Then, the use of the infrared thermal imager is measured under different power settings of AlGaN/GaN HEMTs active region temperature as the boundary condition to optimize parameter model. Then, the junction temperature of the AlGaN/GaN HEMTs is extracted from the model, which has a resolution of 0.05 μm -2 μm. © 2017 IEEE.

关键词:

Aluminum gallium nitride Electronic design automation Failure analysis Failure (mechanical) Gallium nitride High electron mobility transistors III-V semiconductors Infrared imaging Integrated circuits Outages

作者机构:

  • [ 1 ] [Gao, Li]China Electronics Standardization Institute, AnDingMen East Street No.1, Beijing; 100176, China
  • [ 2 ] [Guo, Chunsheng]Beijing University of Technology, No.100 Pingleyuan, Beijing; 100124, China
  • [ 3 ] [Li, Shiwei]Beijing University of Technology, No.100 Pingleyuan, Beijing; 100124, China

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年份: 2017

卷: 2017-July

页码: 1-4

语种: 英文

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WoS核心集被引频次: 0

SCOPUS被引频次: 4

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