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作者:

Wu, Yan (Wu, Yan.) | Ji, Lingfei (Ji, Lingfei.) (学者:季凌飞) | Lin, Zhenyuan (Lin, Zhenyuan.) | Hong, Minghui (Hong, Minghui.) | Wang, Sicong (Wang, Sicong.) | Zhang, Yongzhe (Zhang, Yongzhe.) (学者:张永哲)

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EI Scopus SCIE

摘要:

In this work, KrF excimer laser irradiation of n-type SiC is used to form Ohmic contacts at the interfaces between the irradiated SiC and various types of metals with different work functions without subsequent thermal annealing. Ohmic contacts are formed between laser-treated 6H-SiC and Ti at a laser fluence of 0.7 J/cm(2). Moreover, in the fluence range of 0.7-1.3 J/cm(2), Ohmic characteristics are also observed between irradiated 6HSiC and Au, which is a representative inert metal. The laser-induced heavy doping effect reduces the thickness of the Schottky barrier between the metal and SiC, and the formation of graphene sheets on the irradiated SiC surface reduces the barrier height, resulting in the direct formation of Ohmic contacts. Our findings thus demonstrate the potential of this laser treatment method to achieve Ohmic contacts between n-type SiC and a broad range of metal electrodes without requiring high-temperature annealing.

关键词:

Excimer laser Barrier height Ohmic contact SiC

作者机构:

  • [ 1 ] [Wu, Yan]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Ji, Lingfei]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Lin, Zhenyuan]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Wang, Sicong]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Hong, Minghui]Natl Univ Singapore, Dept Elect & Comp Engn, Singapore 117576, Singapore
  • [ 6 ] [Zhang, Yongzhe]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China

通讯作者信息:

  • 季凌飞

    [Ji, Lingfei]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China

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来源 :

CURRENT APPLIED PHYSICS

ISSN: 1567-1739

年份: 2019

期: 4

卷: 19

页码: 521-527

2 . 4 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:123

JCR分区:2

被引次数:

WoS核心集被引频次: 11

SCOPUS被引频次: 15

ESI高被引论文在榜: 0 展开所有

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