Photo-mask　is　a　pivotal　tool　in　photolithography　process.　The　quality　of　the　photo-mask　has　much　effect　on　the　figures　of　integrate　circuit.　With　the　fast　development　of　the　micro-electronics　technology　and　laser　application　technology,　in　some　advanced　countries,　the　research　on　the　photo-mask　defect　repair　technology,　especially　on　the　clear　defect　laser　repair　technology　has　been　strengthened.　This　paper　focuses　on　this　application.　By　use　of　the　355nm　UV　laser　the　chromium　powder　between　two　piece　of　ultra-white　glass　has　been　affected　to　coat　thin　film　on　the　glass　under　normal　conditions.　We　analyze　the　parameters　of　the　Cr　film　by　experiential　methods　and　also　the　morphology,　thickness,　surface　smoothness,　components　of　the　experiential　results.　The　result　is　that　Cr　film　with　uniform　thickness,　good　adhesion　and　stable　components　can　be　obtained　in　specific　laser　parameters.　Finally　the　conclusion　is　that　this　method　can　be　used　to　repair　the　clear　defect　on　the　Cr-mask.　©　2011　IEEE.