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作者:

Ma, Limin (Ma, Limin.) | Xu, Guangchen (Xu, Guangchen.) | Guo, Fu (Guo, Fu.) (学者:郭福) | Wang, Xitao (Wang, Xitao.)

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EI Scopus

摘要:

Electromigration (EM) has become one of the reliability concerns to the fine pitch solder joint due to its increasing capacity to bear the high current density The EM effects on microstructure evolution of Sn-3.0Ag-0.5Cu+XNi (X=0, 0.05, 0.45, 2.0wt. %) solder joint was investigated. Findings of this study indicated that an appropriate addition of Ni element and moderate ambient temperature can alleviate EM damages in solder joint. The intermetallic compound layer which held a planar type and appropriate thickness improved the resistance of EM effects by suppressing the polarity effect. Ag3Sn and the bulk IMCs also retard the effects from current stressing for the solder joint. © 2011 IEEE.

关键词:

Copper alloys Electromigration Electronics packaging Lead-free solders Packaging Silver alloys Soldered joints Ternary alloys Tin alloys

作者机构:

  • [ 1 ] [Ma, Limin]College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 2 ] [Xu, Guangchen]College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 3 ] [Guo, Fu]College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 4 ] [Wang, Xitao]State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing 100083, China

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年份: 2011

页码: 195-199

语种: 英文

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SCOPUS被引频次: 4

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