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作者:

Chen, Yichuan (Chen, Yichuan.) | Hu, Yuehui (Hu, Yuehui.) | Meng, Qi (Meng, Qi.) | Yan, Hui (Yan, Hui.) (学者:严辉) | Shuai, Weiqiang (Shuai, Weiqiang.) | Zhang, Zhiming (Zhang, Zhiming.)

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EI Scopus SCIE

摘要:

In this work, the natively textured surface of gallium-doped zinc oxide (GZO) films were obtained onto quartz substrates by radio frequency magnetron sputtering. The optimal optoelectronic properties of GZO thin film exhibited the lowest resistivity 6.8x10(-4)cm, where the carrier concentration and carrier mobility were 5.3x10(20)cm(-3) and 17.3cm(2)V(-1)s(-1), respectively, and the transmittance above 87% in the range of 0.4-1.2 mu m. Meanwhile, this GZO thin film had a low surface work function of 3.9eV. We used a two-steps spin-coating method to deposit the perovskite films. The optical band gap of this perovskite films is 1.561eV. The planar perovskite solar cells device modeling based on GZO electron transporting layer was performed by the Solar Cell Capacitance Simulator program. We inputted the electrical and optical parameters of GZO thin film in our perovskite solar cells simulation model. With the increasing of carrier concentration, a high-power conversion efficiency of 20.167% was obtained. Modifying GZO surface, obtaining a suitable surface work function (3.9eV), it could reduce the interlayer contact barrier and optimize the energy level matching. At the perovskite/electron transporting layer interface, no electron barrier was formed, which facilitated electron extraction and reduced interface recombination. The higher power conversion efficiency of 21.132% was obtained.

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作者机构:

  • [ 1 ] [Chen, Yichuan]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Meng, Qi]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Yan, Hui]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Chen, Yichuan]Jingdezhen Ceram Inst, Sch Mech & Elect Engn, Jingdezhen 333403, Jiangxi, Peoples R China
  • [ 5 ] [Hu, Yuehui]Jingdezhen Ceram Inst, Sch Mech & Elect Engn, Jingdezhen 333403, Jiangxi, Peoples R China
  • [ 6 ] [Shuai, Weiqiang]Jingdezhen Ceram Inst, Sch Mech & Elect Engn, Jingdezhen 333403, Jiangxi, Peoples R China
  • [ 7 ] [Zhang, Zhiming]Jingdezhen Ceram Inst, Sch Mech & Elect Engn, Jingdezhen 333403, Jiangxi, Peoples R China

通讯作者信息:

  • 严辉

    [Chen, Yichuan]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China;;[Yan, Hui]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China;;[Chen, Yichuan]Jingdezhen Ceram Inst, Sch Mech & Elect Engn, Jingdezhen 333403, Jiangxi, Peoples R China;;[Hu, Yuehui]Jingdezhen Ceram Inst, Sch Mech & Elect Engn, Jingdezhen 333403, Jiangxi, Peoples R China

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来源 :

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

ISSN: 0957-4522

年份: 2019

期: 5

卷: 30

页码: 4726-4736

2 . 8 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:211

JCR分区:2

被引次数:

WoS核心集被引频次: 18

SCOPUS被引频次: 15

ESI高被引论文在榜: 0 展开所有

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