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作者:

Lin, Zhenyuan (Lin, Zhenyuan.) | Ji, Lingfei (Ji, Lingfei.) (学者:季凌飞) | Wu, Yan (Wu, Yan.) | Hu, Liting (Hu, Liting.) | Yan, Tianyang (Yan, Tianyang.) | Sun, Zhengyang (Sun, Zhengyang.)

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EI Scopus SCIE

摘要:

We used a 193-nm ArF excimer laser to produce a surface functional layer with a tunable Schottky barrier height (SBH) on the n-type 4H-SiC surface. The SBHs of the laser-modified layer/SiC contact ranged from 0.38 +/- 0.05 to 1.82 +/- 0.1 eV. We evaluated the I-V characteristics of Schottky barrier diodes (SBDs) and investigated their corresponding nanoscale current transport characteristics across the laser-modified layer/4H-SiC interface. We attributed changes of the interfacial transport properties between Au and SiC to the laser-induced formation of SiOx/Si compounds with oxygen vacancies in the nitrogen-doped (N-doped) defective graphitic structure. Density functional theory calculations suggested that defect oxide in the SiOx/Si decreased the Schottky barrier width and increased the direct electron tunneling current. Furthermore, the Fermi level of the laser-induced N-doped defective graphitic structure shifted towards the conduction band compared with that of pristine graphene, which was also beneficial for reducing the SBH. This study provides a novel understanding of the interfacial interactions of a laser-modified layer on SiC through nanoscale electrical analysis. These findings will be useful for further investigations of SiC-based nano-photoelectric devices.

关键词:

Excimer laser SiC Interface Schottky barrier height

作者机构:

  • [ 1 ] [Lin, Zhenyuan]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Ji, Lingfei]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Wu, Yan]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Hu, Liting]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Yan, Tianyang]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 6 ] [Sun, Zhengyang]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China

通讯作者信息:

  • 季凌飞

    [Ji, Lingfei]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China

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来源 :

APPLIED SURFACE SCIENCE

ISSN: 0169-4332

年份: 2019

卷: 469

页码: 68-75

6 . 7 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:211

JCR分区:1

被引次数:

WoS核心集被引频次: 11

SCOPUS被引频次: 12

ESI高被引论文在榜: 0 展开所有

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中文被引频次:

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