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作者:

Xu, Hongjun (Xu, Hongjun.) | Huang, Hsin-Pan (Huang, Hsin-Pan.) | Fei, HaiFeng (Fei, HaiFeng.) | Feng, Jiafeng (Feng, Jiafeng.) | Fuh, Huei-Ru (Fuh, Huei-Ru.) | Cho, Jiung (Cho, Jiung.) | Choi, Miri (Choi, Miri.) | Chen, Yanhui (Chen, Yanhui.) | Zhang, Lei (Zhang, Lei.) | Chen, Dengyun (Chen, Dengyun.) | Zhang, Duan (Zhang, Duan.) | Coileain, Cormac (Coileain, Cormac.) | Han, Xiufeng (Han, Xiufeng.) | Chang, Ching -Ray (Chang, Ching -Ray.) | Wu, Han-Chun (Wu, Han-Chun.)

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摘要:

PtS2 is a newly developed group 10 2D layered material with high carrier mobility, wide band gap tunability, strongly bound excitons, symmetrical metallic and magnetic edge states, and ambient stability, making it attractive in nanoelectronic, optoelectronic, and spintronic fields. To the aim of application, a large-scale synthesis is necessary. For transition-metal dichalcogenide (TMD) compounds, a thermally assisted conversion method has been widely used to fabricate wafer-scale thin films. However, PtS2 cannot be easily synthesized using the method, as the tetragonal PtS phase is more stable. Here, we use a specified quartz part to locally increase the vapor pressure of sulfur in a chemical vapor deposition furnace and successfully extend this method for the synthesis of PtS2 thin films in a scalable and controllable manner. Moreover, the PtS and PtS2 phases can be interchangeably converted through a proposed strategy. Field-effect transistor characterization and photocurrent measurements suggest that PtS2 is an ambipolar semiconductor with a narrow band gap. Moreover, PtS2 also shows excellent gas-sensing performance with a detection limit of similar to 0.4 ppb for NO2. Our work presents a relatively simple way of synthesizing PtS2 thin films and demonstrates their promise for high-performance ultrasensitive gas sensing, broadband optoelectronics, and nanoelectronics in a scalable manner. Furthermore, the proposed strategy is applicable for making other PtX2 compounds and TMDs which are compatible with modern silicon technologies.

关键词:

photoelectronic gas sensing 2D materials ambipolar semiconductor platinum disulfide

作者机构:

  • [ 1 ] [Xu, Hongjun]Beijing Inst Technol, Sch Phys, Beijing 100081, Peoples R China
  • [ 2 ] [Fei, HaiFeng]Beijing Inst Technol, Sch Phys, Beijing 100081, Peoples R China
  • [ 3 ] [Chen, Dengyun]Beijing Inst Technol, Sch Phys, Beijing 100081, Peoples R China
  • [ 4 ] [Zhang, Duan]Beijing Inst Technol, Sch Phys, Beijing 100081, Peoples R China
  • [ 5 ] [Coileain, Cormac]Beijing Inst Technol, Sch Phys, Beijing 100081, Peoples R China
  • [ 6 ] [Wu, Han-Chun]Beijing Inst Technol, Sch Phys, Beijing 100081, Peoples R China
  • [ 7 ] [Huang, Hsin-Pan]Natl Taiwan Univ, Grad Inst Appl Phys, Taipei 106, Taiwan
  • [ 8 ] [Chang, Ching -Ray]Natl Taiwan Univ, Grad Inst Appl Phys, Taipei 106, Taiwan
  • [ 9 ] [Xu, Hongjun]Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Univ Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China
  • [ 10 ] [Feng, Jiafeng]Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Univ Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China
  • [ 11 ] [Han, Xiufeng]Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Univ Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China
  • [ 12 ] [Fuh, Huei-Ru]Yuan Ze Univ, Dept Chem Engn & Mat Sci, Taoyuan 320, Taiwan
  • [ 13 ] [Cho, Jiung]Korea Basic Sci Inst, Western Seoul Ctr, Seoul 03579, South Korea
  • [ 14 ] [Choi, Miri]Korea Basic Sci Inst, Chuncheon Ctr, Chunchon 24341, South Korea
  • [ 15 ] [Chen, Yanhui]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 16 ] [Zhang, Lei]Tianjin Univ, Sch Chem Engn & Technol, Tianjin 300072, Peoples R China
  • [ 17 ] [Coileain, Cormac]Trinity Coll Dublin, Sch Chem, AMBER, Dublin 2, Ireland
  • [ 18 ] [Coileain, Cormac]Trinity Coll Dublin, CRANN, Dublin 2, Ireland
  • [ 19 ] [Chang, Ching -Ray]Natl Taiwan Univ, Dept Phys, Taipei 106, Taiwan

通讯作者信息:

  • [Wu, Han-Chun]Beijing Inst Technol, Sch Phys, Beijing 100081, Peoples R China

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来源 :

ACS APPLIED MATERIALS & INTERFACES

ISSN: 1944-8244

年份: 2019

期: 8

卷: 11

页码: 8202-8209

9 . 5 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:211

JCR分区:1

被引次数:

WoS核心集被引频次: 39

SCOPUS被引频次: 39

ESI高被引论文在榜: 0 展开所有

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中文被引频次:

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