The　influence　of　Fe　content　on　the　structural　and　optoelectronic　properties　of　Fe-doped　CuAlO2　films　was　studied.　X-ray　diffraction　(XRD)　results　revealed　that　all　annealed　films　had　a　pure　delafossite　phase.　Optical　transmittance　spectra　showed　that　Fe-doped　films　exhibit　an　obvious　change　in　the　340-380　nm　region　compared　to　undoped　CuAlO2,　and　optical　band　gap　analyses　confirmed　the　formation　of　impurity　band　levels　within　the　bandgap.　The　average　transmittance　of　CuAl1-xFexO2　is　around　45-55%　in　the　visible　range,　and　transmittance　in　this　region　decreases　with　increasing　Fe　concentration.　Increased　conductivity　was　observed　due　to　the　introduction　of　Fe　and　subsequent　carrier　concentration　enhancement.　The　conductivity　in　a　CuAl0.85Fe0.15O2　film　was　maximized　at　1.10　x　10(-2)　S　cm(-1).