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作者:

Wang Pengfei (Wang Pengfei.) | Zhu Hui (Zhu Hui.) | Zhang Yingqiao (Zhang Yingqiao.) | Feng Shiwei (Feng Shiwei.) (学者:冯士维) | Guo Chunsheng (Guo Chunsheng.) | Zhang Yamin (Zhang Yamin.) | Meng Xiao (Meng Xiao.) | Qi Qiong (Qi Qiong.)

收录:

EI Scopus SCIE

摘要:

The (001) oriented BiFeO3 thin film was deposited on the Nb:SrTiO3 substrate by radio frequency magnetron sputtering technology, and the bipolar resistive switching effect was observed in the BiFeO3/Nb: SrTiO3 heterostructure. The results showed that the ratio between the high resistance and low resistance was more than two orders at a reading pulse of -0.5 V and it exhibited excellent retention over 3600 s. The current density-voltage characteristic was dominated by the space-charge-limited conduction. The resistive switching effect of the structure was attributed to the trapping/detrapping of the charge carriers.

关键词:

BiFeO3 films bipolar resistive switching space-charge-limited conduction sputter

作者机构:

  • [ 1 ] [Wang Pengfei]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Zhu Hui]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Zhang Yingqiao]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Feng Shiwei]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 5 ] [Guo Chunsheng]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 6 ] [Zhang Yamin]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 7 ] [Meng Xiao]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 8 ] [Qi Qiong]Chinese Acad Sci, Inst Semicond, Natl Engn Res Ctr Optoelect Devices, Beijing 100083, Peoples R China

通讯作者信息:

  • [Zhu Hui]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China

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来源 :

JOURNAL OF WUHAN UNIVERSITY OF TECHNOLOGY-MATERIALS SCIENCE EDITION

ISSN: 1000-2413

年份: 2018

期: 6

卷: 33

页码: 1360-1364

1 . 6 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:131

JCR分区:4

被引次数:

WoS核心集被引频次: 1

SCOPUS被引频次: 1

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

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