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作者:

Li, Yu-Jia (Li, Yu-Jia.) | Wu, Hua-Qiang (Wu, Hua-Qiang.) | Gao, Bin (Gao, Bin.) | Hua, Qi-Lin (Hua, Qi-Lin.) | Zhang, Zhao (Zhang, Zhao.) | Zhang, Wan-Rong (Zhang, Wan-Rong.) (学者:张万荣) | Qian, He (Qian, He.)

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摘要:

The impact of the variations of threshold voltage (V-th) and hold voltage (V-hold) of threshold switching (TS) selector in 1S1R crossbar array is investigated. Based on ON/OFF state I-V curves measurements from a large number of Ag-filament TS selectors, V-th and V-hold are extracted and their variations distribution expressions are obtained, which are then employed to evaluate the impact on read process and write process in 32 x 32 1S1R crossbar array under different bias schemes. The results indicate that V-th and V-hold variations of TS selector can lead to degradation of 1S1R array performance parameters, such as minimum read/write voltage, bit error rate (BER), and power consumption. For the read process, a small V-hold variation not only results in the minimum read voltage increasing but it also leads to serious degradation of BER. As the standard deviation of V-hold and V-th increases, the BER and the power consumption of 151R crossbar array under 1/2 bias, 1/3 bias, and floating scheme degrade, and the case under 1/2 bias tends to be more serious compared with other two schemes. For the write process, the minimum write voltage also increases with the variation of V-hold from small to large value. A slight increase of V-th standard deviation not only decreases write power efficiency markedly but also increases write power consumption. These results have reference significance to understand the voltage variation impacts and design of selector properly.

关键词:

crossbar array RRAM threshold switching selector variation

作者机构:

  • [ 1 ] [Li, Yu-Jia]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Zhang, Zhao]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Zhang, Wan-Rong]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Li, Yu-Jia]Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China
  • [ 5 ] [Wu, Hua-Qiang]Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China
  • [ 6 ] [Gao, Bin]Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China
  • [ 7 ] [Hua, Qi-Lin]Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China
  • [ 8 ] [Qian, He]Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China

通讯作者信息:

  • 张万荣

    [Zhang, Wan-Rong]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China;;[Wu, Hua-Qiang]Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China

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来源 :

CHINESE PHYSICS B

ISSN: 1674-1056

年份: 2018

期: 11

卷: 27

1 . 7 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:76

JCR分区:3

被引次数:

WoS核心集被引频次: 6

SCOPUS被引频次: 6

ESI高被引论文在榜: 0 展开所有

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中文被引频次:

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