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Author:

Cao, Shiwei (Cao, Shiwei.) | Xing, Yanhui (Xing, Yanhui.) | Han, Jun (Han, Jun.) | Luo, Xin (Luo, Xin.) | Lv, Wenxing (Lv, Wenxing.) | Lv, Weiming (Lv, Weiming.) | Zhang, Baoshun (Zhang, Baoshun.) | Zeng, Zhongming (Zeng, Zhongming.)

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EI Scopus SCIE PubMed

Abstract:

The van der Waals (vdW) heterostructure, made up of two dissimilar two-dimensional materials held together by van der Waals interactions, has excellent electronic and optoelectronic properties as it provides a superior interface quality without the lattice mismatch problem. Here, we report the development and photoresponse characteristics of a p-n diode based on a stacked black phosphorus (BP) and rhenium disulfide (ReS2) heterojunction. The heterojunction showed a clear gate-tunable rectifying behavior similar to that of the conventional p-n junction diode. Under UV illumination, the BP/ReS2 p-n diode displayed a high photoresponsivity of 4120 A W-1 and we were able to modify the photoresponse properties by adjusting the back gate voltage. Moreover, an investigation of various channel lengths yielded the highest photoresponsivity of 11 811 A W-1 for a BP length of 1 mu m. These results suggested vdW 2D materials to be promising for developing advanced heterojunction devices for nano-optoelectronics.

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Author Community:

  • [ 1 ] [Cao, Shiwei]Beijing Univ Technol, Coll Microelect, Minist Educ, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Xing, Yanhui]Beijing Univ Technol, Coll Microelect, Minist Educ, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Han, Jun]Beijing Univ Technol, Coll Microelect, Minist Educ, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Cao, Shiwei]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Ruoshui Rd 398, Suzhou 215123, Peoples R China
  • [ 5 ] [Luo, Xin]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Ruoshui Rd 398, Suzhou 215123, Peoples R China
  • [ 6 ] [Lv, Wenxing]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Ruoshui Rd 398, Suzhou 215123, Peoples R China
  • [ 7 ] [Lv, Weiming]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Ruoshui Rd 398, Suzhou 215123, Peoples R China
  • [ 8 ] [Zhang, Baoshun]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Ruoshui Rd 398, Suzhou 215123, Peoples R China
  • [ 9 ] [Zeng, Zhongming]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Ruoshui Rd 398, Suzhou 215123, Peoples R China

Reprint Author's Address:

  • [Xing, Yanhui]Beijing Univ Technol, Coll Microelect, Minist Educ, Key Lab Optoelect Technol, Beijing 100124, Peoples R China;;[Zeng, Zhongming]Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Ruoshui Rd 398, Suzhou 215123, Peoples R China

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Source :

NANOSCALE

ISSN: 2040-3364

Year: 2018

Issue: 35

Volume: 10

Page: 16805-16811

6 . 7 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:145

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count: 60

SCOPUS Cited Count: 62

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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