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Author:

Wu, X. (Wu, X..) | Wang, B. (Wang, B..) (Scholars:王波) | Chen, G. (Chen, G..) (Scholars:陈戈) | Li, H. (Li, H..)

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Scopus

Abstract:

Carbon nitride (CNx) thin films have been synthesized by hot filament assisted r.f. plasma-enhanced chemical vapor deposition with negative bias methods on Si (100) substrates. The influences on the thin film structure and hardness characteristics of r.f. power and substrate negative bias have been emphatically investigated. The optimal preparation parameters have been summarized as follows: r.f. power of 200W, substrate negative bias of -200V, substrate temperature of about 600°C, total reactive gas pressure of about 110Pa, flow ratio of CH4 to N2 of 1: 5.5.

Keyword:

Author Community:

  • [ 1 ] [Wu, X.]Department of Physics, Lanzhou University, Lanzhou 730000, China
  • [ 2 ] [Wang, B.]Department of Applied Physics, Beijing Polytechnic University, Beijing 100022, China
  • [ 3 ] [Chen, G.]Department of Applied Physics, Beijing Polytechnic University, Beijing 100022, China
  • [ 4 ] [Li, H.]Department of Chemistry, Lanzhou University, Lanzhou 730000, China

Reprint Author's Address:

  • [Wu, X.]Department of Physics, Lanzhou University, Lanzhou 730000, China

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Source :

International Journal of Modern Physics B

ISSN: 0217-9792

Year: 2002

Issue: 6-7

Volume: 16

Page: 1105-1109

Language: English

1 . 7 0 0

JCR@2022

ESI Discipline: PHYSICS;

JCR Journal Grade:4

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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