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Author:

Zhou, KaiLing (Zhou, KaiLing.) | Wang, Hao (Wang, Hao.) (Scholars:汪浩) | Liu, Jingbing (Liu, Jingbing.) | Yan, Hui (Yan, Hui.)

Indexed by:

SCIE

Abstract:

The electrochromic WO3 devices normally suffer from the degradation of long-term performances since the accumulation of trapped ions in the host structure. In this study, we notice that the degradation of WO3 film consists of the decrease of bleaching state and the decay of coloration state, and the latter is the main factor of affecting the cyclic stability of the WO3 film. Here, it is discovered that the degradation of coloration state is due to the decrease of the charge density of inserted ions in the film during cycling process. By employing the open circuit potential (OCP) measurement, we find that the accumulation of trapped ions in WO3 film will cause the decay of OCP between the work electrode of WO3 film and counter electrode, which is the main reason of the decrease of inserted ions. This is because that the decay of OCP will weaken the electric field force used to drive ions into the film and shorten the duration time of ion insertion process. Consequently, the decline of charge density of the inserted ions will cause the decay of coloration state, which is the real mechanism of trapped ions eroding the cyclic life of the WO3 film.

Keyword:

Open circuit potential Trapped ions Degradation Electrochromism

Author Community:

  • [ 1 ] [Zhou, KaiLing]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Wang, Hao]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Liu, Jingbing]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Yan, Hui]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China

Reprint Author's Address:

  • 汪浩

    [Wang, Hao]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China

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Source :

INTERNATIONAL JOURNAL OF ELECTROCHEMICAL SCIENCE

ISSN: 1452-3981

Year: 2018

Issue: 8

Volume: 13

Page: 7335-7346

1 . 5 0 0

JCR@2022

ESI Discipline: CHEMISTRY;

ESI HC Threshold:192

JCR Journal Grade:4

Cited Count:

WoS CC Cited Count: 18

SCOPUS Cited Count: 18

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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