CVD diamond cold cathode with high current density and low threshold field - 文章详情页

作者：

Zhang, Y. (Zhang, Y..) (学者：张勇) | Zhu, H. (Zhu, H..) | Shen, D. (Shen, D..) | Chen, G. (Chen, G..) (学者：陈戈) | Yang, N. (Yang, N..)

收录：

Scopus

摘要：

A　diamond　film　cold　cathode　was　prepared　by　the　microwave-plasma-assisted　CVD　technique　using　copper　as　the　substrate.　The　field　emission　properties　of　the　diamond　films　were　investigated　by　measuring　the　emission　current　versus　the　electric　field.　A　threshold　field　strength　as　low　as　1.09　V/μm,　and　a　current　density　as　high　as　418　mA/cm2　were　observed.　©　2001　Technomic　Publishing　Co.,　Inc.

关键词：

CVD; Diamond film; Electron field emission

作者机构：

[ 1 ] [Zhang, Y.]Research Center of Materials Science, Beijing Institute of Technology, Beijing 100081, China
[ 2 ] [Zhu, H.]Research Center of Materials Science, Beijing Institute of Technology, Beijing 100081, China
[ 3 ] [Shen, D.]Research Center of Materials Science, Beijing Institute of Technology, Beijing 100081, China
[ 4 ] [Chen, G.]College of Materials Science, Beijing Polytechnic University, Beijing 100022, China
[ 5 ] [Yang, N.]College of Materials Science, Beijing Polytechnic University, Beijing 100022, China

通讯作者信息：

[Zhu, H.]Research Center of Materials Science, Beijing Institute of Technology, Beijing 100081, China

电子邮件地址：

hszhu@bit.edu.cn

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