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作者:

Zhou, J. (Zhou, J..) (学者:周剑) | Shang, D. (Shang, D..) | Liu, X. (Liu, X..) (学者:刘晓) | Liu, H. (Liu, H..)

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摘要:

A new uniaxial tensile fatigue testing system was set up by the use of a micro-mechanical fatigue testing machine and an optical microscope for thin film specimen. The mechanical and fatigue behaviors of single crystal silicon (SCS) thin film with V shape notch were studied under cyclic fluctuating loading. Comparison of the fatigue testing data for the notched SCS thin film and the smooth SCS thin film shows that the resisting ability to bending moment and fracture stress of the notched SCS thin film are obviously decreased, and the failure behavior is similar to that of the macro silicon material. SEM(scanning electron microscope) fractograph analysis for the smooth SCS thin film and the notched SCS thin film showed that the brittle fatigue failure behavior is evidenced by the brittle fatigue stripes on the fracture surfaces of both kinds of SCS thin films under cyclic fluctuating loading, and the characteristics of surface are related to the structure of SCS.

关键词:

Fatigue; Fractograph; Micro-electro-mechanical system; Out chip testing; Single crystal silicon; Thin film

作者机构:

  • [ 1 ] [Zhou, J.]College of Mechanical Engineering and Applied Electronics Technology, Beijing University of Technology, Beijing 100124, China
  • [ 2 ] [Shang, D.]College of Mechanical Engineering and Applied Electronics Technology, Beijing University of Technology, Beijing 100124, China
  • [ 3 ] [Liu, X.]College of Mechanical Engineering and Applied Electronics Technology, Beijing University of Technology, Beijing 100124, China
  • [ 4 ] [Liu, H.]College of Mechanical Engineering and Applied Electronics Technology, Beijing University of Technology, Beijing 100124, China

通讯作者信息:

  • 周剑

    [Zhou, J.]College of Mechanical Engineering and Applied Electronics Technology, Beijing University of Technology, Beijing 100124, China

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来源 :

Journal of Mechanical Strength

ISSN: 1001-9669

年份: 2010

期: 5

卷: 32

页码: 790-794

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