Properties of ZnO thin films with effect of substrate temperature by PLD - 文章详情页

作者：

收录：

Scopus PKU CSCD

摘要：

ZnO　thin　films　are　deposited　on　sapphire　(0001)　substrates　by　a　high-purity　ZnO　target　and　a　pulsed　Nd:YAG　laser　with　a　wavelength　of　355　nm.　The　structural,　optical　and　electrical　properties　of　ZnO　thin　films　are　grown　and　investigated　in　various　substrate　temperatures.　The　morphological　propertie　of　the　films　is　analyzed　by　atomic　force　microscopy　(AFM).　The　optical　properties　and　electrical　properties　of　the　films　are　investigated　by　Raman　scattering　and　ultraviolet　photoluminescence　(PL)　emission　and　FTIR　Hall-effect　measurements,　respectively.　The　results　of　the　temperature　of　the　substrate　is　a　highly　important　parameter　to　influence　the　film　morphology　and　films　grown,　and　the　high　quality　crystallinity　has　an　excellent　UV　emission　at　500°C.

关键词：

AFM; FTIR; Hall effect; PL; PLD; Raman; ZnO films

作者机构：

[ 1 ] [Su, X.-Q.]College of Applied Sciences, Beijing University of Technology, Beijing 100124, China
[ 2 ] [Wang, L.]College of Applied Sciences, Beijing University of Technology, Beijing 100124, China
[ 3 ] [Chen, J.-B.]College of Applied Sciences, Beijing University of Technology, Beijing 100124, China
[ 4 ] [Kong, L.]College of Applied Sciences, Beijing University of Technology, Beijing 100124, China
[ 5 ] [Liu, H.-M.]College of Applied Sciences, Beijing University of Technology, Beijing 100124, China
[ 6 ] [Zhang, X.-P.]College of Applied Sciences, Beijing University of Technology, Beijing 100124, China

通讯作者信息：

王丽
[Wang, L.]College of Applied Sciences, Beijing University of Technology, Beijing 100124, China

电子邮件地址：

Lwang.1@bjut.edu.cn

查看成果更多字段

成果类型
所属机构

所有年份指定年份从至