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作者:

Tong, Hui (Tong, Hui.) | Yang, Zhenhai (Yang, Zhenhai.) | Wang, Xixi (Wang, Xixi.) | Liu, Zhaolang (Liu, Zhaolang.) | Chen, Zhenxin (Chen, Zhenxin.) | Ke, Xiaoxing (Ke, Xiaoxing.) | Sui, Manling (Sui, Manling.) (学者:隋曼龄) | Tang, Jiang (Tang, Jiang.) | Yu, Tianbao (Yu, Tianbao.) | Ge, Ziyi (Ge, Ziyi.) | Zeng, Yuheng (Zeng, Yuheng.) | Gao, Pingqi (Gao, Pingqi.) | Ye, Jichun (Ye, Jichun.)

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EI Scopus SCIE

摘要:

Silicon (Si)-based dopant-free heterojunction solar cells (SCs) featuring carrier-selective contacts (CSCs) have attracted considerable interest due to the extreme simplifications in their device structure and manufacturing procedure. However, these SCs are limited by the unsatisfactory contact properties on both sides of the junction, and their efficiencies are not comparable with those of commercially available Si SCs. In this report, a high-performance silicon-oxide/magnesium (SiOx/Mg) electron-selective contact (ESC) design is described. Combining an ultrathin SiOx and a low work function Mg layer, the novel ESC simultaneously yields low recombinative and resistive losses. In addition, deposition of Mg on SiOx relaxes the restriction on the threshold thickness of the SiOx for electron tunneling and therefore broadens the optimization space for rear-sided passivation. Meanwhile, hole-selective contact with boosted light harvesting and suppressed interfacial recombination is achieved by forming a fully conformal contact between the conducting poly(3,4-ethylene dioxythiophene): poly(styrenesulfonate) (PEDOT: PSS) and periodic Si pyramid arrays. With the double-sided carrier-selective contact designs, PEDOT: PSS/Si/SiOx/MgSCs with efficiency of 15% are finally obtained via a totally dopant-free processing. Subsequent calculations further indicate a pathway for the improvement of these contacts toward an efficiency that is competitive with conventionally diffused pn junction SCs.

关键词:

heterojunction solar cells low work-function metal dopant-free selective contact

作者机构:

  • [ 1 ] [Tong, Hui]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 2 ] [Yang, Zhenhai]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 3 ] [Wang, Xixi]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 4 ] [Liu, Zhaolang]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 5 ] [Ge, Ziyi]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 6 ] [Zeng, Yuheng]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 7 ] [Gao, Pingqi]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 8 ] [Ye, Jichun]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 9 ] [Tong, Hui]Univ Chinese Acad Sci, Coll Mat & Sci & Optielect Technol, Beijing 100049, Peoples R China
  • [ 10 ] [Wang, Xixi]Nanchang Univ, Dept Phys, Nanchang 330031, Jiangxi, Peoples R China
  • [ 11 ] [Yu, Tianbao]Nanchang Univ, Dept Phys, Nanchang 330031, Jiangxi, Peoples R China
  • [ 12 ] [Chen, Zhenxin]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 13 ] [Ke, Xiaoxing]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 14 ] [Sui, Manling]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 15 ] [Tang, Jiang]HUST, WNLO, Wuhan 430074, Hubei, Peoples R China

通讯作者信息:

  • [Zeng, Yuheng]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China;;[Gao, Pingqi]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China;;[Ye, Jichun]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

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来源 :

ADVANCED ENERGY MATERIALS

ISSN: 1614-6832

年份: 2018

期: 16

卷: 8

2 7 . 8 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:260

JCR分区:1

被引次数:

WoS核心集被引频次: 54

SCOPUS被引频次: 47

ESI高被引论文在榜: 0 展开所有

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