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Author:

Tong, Hui (Tong, Hui.) | Yang, Zhenhai (Yang, Zhenhai.) | Wang, Xixi (Wang, Xixi.) | Liu, Zhaolang (Liu, Zhaolang.) | Chen, Zhenxin (Chen, Zhenxin.) | Ke, Xiaoxing (Ke, Xiaoxing.) | Sui, Manling (Sui, Manling.) (Scholars:隋曼龄) | Tang, Jiang (Tang, Jiang.) | Yu, Tianbao (Yu, Tianbao.) | Ge, Ziyi (Ge, Ziyi.) | Zeng, Yuheng (Zeng, Yuheng.) | Gao, Pingqi (Gao, Pingqi.) | Ye, Jichun (Ye, Jichun.)

Indexed by:

EI Scopus SCIE

Abstract:

Silicon (Si)-based dopant-free heterojunction solar cells (SCs) featuring carrier-selective contacts (CSCs) have attracted considerable interest due to the extreme simplifications in their device structure and manufacturing procedure. However, these SCs are limited by the unsatisfactory contact properties on both sides of the junction, and their efficiencies are not comparable with those of commercially available Si SCs. In this report, a high-performance silicon-oxide/magnesium (SiOx/Mg) electron-selective contact (ESC) design is described. Combining an ultrathin SiOx and a low work function Mg layer, the novel ESC simultaneously yields low recombinative and resistive losses. In addition, deposition of Mg on SiOx relaxes the restriction on the threshold thickness of the SiOx for electron tunneling and therefore broadens the optimization space for rear-sided passivation. Meanwhile, hole-selective contact with boosted light harvesting and suppressed interfacial recombination is achieved by forming a fully conformal contact between the conducting poly(3,4-ethylene dioxythiophene): poly(styrenesulfonate) (PEDOT: PSS) and periodic Si pyramid arrays. With the double-sided carrier-selective contact designs, PEDOT: PSS/Si/SiOx/MgSCs with efficiency of 15% are finally obtained via a totally dopant-free processing. Subsequent calculations further indicate a pathway for the improvement of these contacts toward an efficiency that is competitive with conventionally diffused pn junction SCs.

Keyword:

heterojunction solar cells low work-function metal dopant-free selective contact

Author Community:

  • [ 1 ] [Tong, Hui]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 2 ] [Yang, Zhenhai]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 3 ] [Wang, Xixi]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 4 ] [Liu, Zhaolang]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 5 ] [Ge, Ziyi]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 6 ] [Zeng, Yuheng]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 7 ] [Gao, Pingqi]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 8 ] [Ye, Jichun]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
  • [ 9 ] [Tong, Hui]Univ Chinese Acad Sci, Coll Mat & Sci & Optielect Technol, Beijing 100049, Peoples R China
  • [ 10 ] [Wang, Xixi]Nanchang Univ, Dept Phys, Nanchang 330031, Jiangxi, Peoples R China
  • [ 11 ] [Yu, Tianbao]Nanchang Univ, Dept Phys, Nanchang 330031, Jiangxi, Peoples R China
  • [ 12 ] [Chen, Zhenxin]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 13 ] [Ke, Xiaoxing]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 14 ] [Sui, Manling]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 15 ] [Tang, Jiang]HUST, WNLO, Wuhan 430074, Hubei, Peoples R China

Reprint Author's Address:

  • [Zeng, Yuheng]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China;;[Gao, Pingqi]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China;;[Ye, Jichun]Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

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Source :

ADVANCED ENERGY MATERIALS

ISSN: 1614-6832

Year: 2018

Issue: 16

Volume: 8

2 7 . 8 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:260

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count: 55

SCOPUS Cited Count: 50

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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