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作者:

Yang, Yunfei (Yang, Yunfei.) | Wang, Yiman (Wang, Yiman.) | Liu, Wei (Liu, Wei.) | Pan, Zhaoliu (Pan, Zhaoliu.) | Li, Junhui (Li, Junhui.) | Wang, Jinshu (Wang, Jinshu.) (学者:王金淑)

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EI Scopus SCIE

摘要:

In order for practical applications in vacuum electron devices, the robustness of scandia-doped dispenser (SDD) cathode is a major concern. Emission properties after air exposure and gas poisoning have, therefore, been studied. A full restoring of emission has been proved after the cathodes were exposed to air and reactivated for a time much shorter than initial activation. Poisoning experiments demonstrated that the poisoning pressure thresholds of residual gases for the SDD cathode are about half to one order of magnitude higher at equivalent temperatures but with higher emission level in comparison with that of an excellent M cathode. The cathode is easier to recover after poisoning and can operate stably in a nonideal environment. These features are thought to be related to the surface Ba-Sc-O structure which has closely chemical association, better stability for air exposure, relatively high tolerance to gas poisoning, and the semiconductor emission characteristic.

关键词:

Air exposure electron emission gas poisoning scandate cathodes vacuum electron device (VED)

作者机构:

  • [ 1 ] [Yang, Yunfei]Beijing Univ Technol, Sch Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Wang, Yiman]Beijing Univ Technol, Sch Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Liu, Wei]Beijing Univ Technol, Sch Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Pan, Zhaoliu]Beijing Univ Technol, Sch Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Li, Junhui]Beijing Univ Technol, Sch Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 6 ] [Wang, Jinshu]Beijing Univ Technol, Sch Mat Sci & Engn, Beijing 100124, Peoples R China

通讯作者信息:

  • 王金淑

    [Wang, Jinshu]Beijing Univ Technol, Sch Mat Sci & Engn, Beijing 100124, Peoples R China

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来源 :

IEEE TRANSACTIONS ON ELECTRON DEVICES

ISSN: 0018-9383

年份: 2018

期: 6

卷: 65

页码: 2072-2076

3 . 1 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:76

被引次数:

WoS核心集被引频次: 8

SCOPUS被引频次: 8

ESI高被引论文在榜: 0 展开所有

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