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作者:

Zheng, Xiang (Zheng, Xiang.) | Feng, Shiwei (Feng, Shiwei.) (学者:冯士维) | Zhang, Yamin (Zhang, Yamin.) | Li, Jingwei (Li, Jingwei.)

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摘要:

The temperature dependence of the Schottky voltage under a forward constant current was used as a means to measure the transient temperature characteristics of gallium nitride (GaN) high-electron-mobility transistors (HEMTs). However, the degradationof the Schottky diode leads to error in the calculated temperature measurement results, especially at a high forward Schottky current. In this paper, we characterized the degradation of GaN HEMT Schottky diodes under forward bias using pulsed current-voltage measurements. The forward Schottky voltage behavior at constant currents of 0.2, 0.35, 0.5, 1, 1.5, and 2 mA was monitored. In particular, the vertical temperature distribution was corrected experimentally based on the transient voltage measurements. The success of this correction indicates that the said artifacts can be removed using the transient voltagemeasurements. This method increases the accuracy of temperature measurements when the temperature dependence of the Schottky voltage is used to characterize the behavior of GaN HEMTs.

关键词:

Forward schottky voltage gallium nitride (GaN) high-electron-mobility transistor (HEMT) schottky diode degradation temperature measurements

作者机构:

  • [ 1 ] [Zheng, Xiang]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 2 ] [Feng, Shiwei]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 3 ] [Zhang, Yamin]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 4 ] [Li, Jingwei]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China

通讯作者信息:

  • 冯士维

    [Feng, Shiwei]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China;;[Zhang, Yamin]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China

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来源 :

IEEE TRANSACTIONS ON ELECTRON DEVICES

ISSN: 0018-9383

年份: 2018

期: 5

卷: 65

页码: 1734-1738

3 . 1 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:76

被引次数:

WoS核心集被引频次: 3

SCOPUS被引频次: 2

ESI高被引论文在榜: 0 展开所有

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