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作者:

Zhu, Hui (Zhu, Hui.) | Yang, Ying (Yang, Ying.) | Meng, Xiao (Meng, Xiao.) | Jiang, Anquan (Jiang, Anquan.) | Bai, Zilong (Bai, Zilong.) | Zheng, Xiang (Zheng, Xiang.) | Jin, Lei (Jin, Lei.) | Wang, Chen (Wang, Chen.) | Feng, Shiwei (Feng, Shiwei.) (学者:冯士维)

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EI Scopus SCIE

摘要:

We present a method to study the trap characteristics in BiFeO3 thin films, which display a resistance switching effect caused by trapping/detrapping of charge carriers. The method consists of measuring the current transients for the detrapping of charge carriers from trap sites and subsequent analysis of the time constant from the current transient curve. Using this method, the energy level of the traps was identified to be 0.71 +/- 0.06 eV. The parameters of the trapping pulses (voltage and time duration) were found to affect the time constant, indicating a close relationship between the escape frequency of the charge carriers and the structure ordering caused by polarization and the filling of the traps. Published by AIP Publishing.

关键词:

作者机构:

  • [ 1 ] [Zhu, Hui]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Yang, Ying]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Meng, Xiao]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Zheng, Xiang]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 5 ] [Jin, Lei]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 6 ] [Wang, Chen]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 7 ] [Feng, Shiwei]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 8 ] [Jiang, Anquan]Fudan Univ, Coll Microelect, Shanghai 200433, Peoples R China
  • [ 9 ] [Bai, Zilong]Fudan Univ, Coll Microelect, Shanghai 200433, Peoples R China

通讯作者信息:

  • [Zhu, Hui]Beijing Univ Technol, Sch Microelect, Fac Informat Technol, Beijing 100124, Peoples R China

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来源 :

APPLIED PHYSICS LETTERS

ISSN: 0003-6951

年份: 2018

期: 18

卷: 112

4 . 0 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:145

JCR分区:1

被引次数:

WoS核心集被引频次: 14

SCOPUS被引频次: 15

ESI高被引论文在榜: 0 展开所有

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中文被引频次:

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