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作者:

Yu, N. (Yu, N..) | Wang, H.-H. (Wang, H.-H..) | Liu, F.-F. (Liu, F.-F..) | Du, Z.-J. (Du, Z.-J..) | Wang, Y.-H. (Wang, Y.-H..) | Song, H.-H. (Song, H.-H..) | Zhu, Y.-X. (Zhu, Y.-X..) | Sun, J. (Sun, J..)

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摘要:

The effect of multilayer Ti/Al structure electrode on AlGaN/GaN HEMT Ohmic contact characteristics and the surface morphology were investigated. The specific contact resistance of all kinds of electrode structure was measured by transmission line model (TLM). The scanning electron microscope (SEM) was used to measure the electrode surface morphology. The experiment results show that the special contact resistance tend to decrease and the surface morphology tend to be smooth with the increasing of the number of Ti/Al layers in the same annealing conditions. The reducing of the thickness of Ti/Al layer can increase the specific contact resistance because of Au in-diffusion, but can slightly improve the surface morphology. High Ti ratio can reduce the formation of TiN, and lead to the increasing of specific contact resistance, but can greatly improve the surface morphology. © 2016, Science Press. All right reserved.

关键词:

Annealing; High electron mobility transistor; Ohmic contact; Specific contact resistance

作者机构:

  • [ 1 ] [Yu, N.]Beijing Optoelectronic Technology Laboratory, Beijing University of Technology, Beijing, 100124, China
  • [ 2 ] [Wang, H.-H.]State Key Laboratory of Electronic Thin Films and Integrated Devices, Zhongshan Institute, University of Electronic Science and Technology of China, Zhongshan, 528402, China
  • [ 3 ] [Liu, F.-F.]Beijing Optoelectronic Technology Laboratory, Beijing University of Technology, Beijing, 100124, China
  • [ 4 ] [Du, Z.-J.]Beijing Optoelectronic Technology Laboratory, Beijing University of Technology, Beijing, 100124, China
  • [ 5 ] [Wang, Y.-H.]Beijing Optoelectronic Technology Laboratory, Beijing University of Technology, Beijing, 100124, China
  • [ 6 ] [Song, H.-H.]Beijing Optoelectronic Technology Laboratory, Beijing University of Technology, Beijing, 100124, China
  • [ 7 ] [Zhu, Y.-X.]Beijing Optoelectronic Technology Laboratory, Beijing University of Technology, Beijing, 100124, China
  • [ 8 ] [Sun, J.]Beijing Optoelectronic Technology Laboratory, Beijing University of Technology, Beijing, 100124, China

通讯作者信息:

  • [Zhu, Y.-X.]Beijing Optoelectronic Technology Laboratory, Beijing University of TechnologyChina

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来源 :

Chinese Journal of Luminescence

ISSN: 1000-7032

年份: 2016

期: 2

卷: 37

页码: 219-223

被引次数:

WoS核心集被引频次: 0

SCOPUS被引频次: 3

ESI高被引论文在榜: 0 展开所有

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