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作者:

Wu, Lifang (Wu, Lifang.) (学者:毋立芳) | Zhao, Lidong (Zhao, Lidong.) | Jian, Meng (Jian, Meng.) | Mao, Yuxin (Mao, Yuxin.) | Yu, Miao (Yu, Miao.) | Guo, Xiaohua (Guo, Xiaohua.)

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摘要:

Purpose In some three-dimensional (3D) printing application scenarios, e.g., model manufacture, it is necessary to print large-sized objects. However, it is impossible to implement large-size 3D printing using a single projector in digital light processing (DLP)-based mask projection 3D printing because of the limitations of the digital micromirror device chips. Design/methodology/approach A multi-projector DLP with energy homogenization (EHMP-DLP) scheme is proposed for large-size 3D printing. First, a large-area printing plane is established by tiling multiple projectors. Second, the projector set's tiling pattern is obtained automatically, and the maximum printable plane is determined. Third, the energy is homogenized across the entire printable plane by adjusting gray levels of the images input into the projectors. Finally, slices are automatically segmented based on the tiling pattern of the projector set, and the gray levels of these slices are reassigned based on the images of the corresponding projectors. Findings Large-area high-intensity projection for mask projection 3D printing can be performed by tiling multiple DLP projectors. The tiled projector output energies can be homogenized by adjusting the images of the projectors. Uniform ultraviolet energy is important for high-quality printing. Practical implications A prototype device is constructed using two projectors. The printable area becomes 140 x 210 mm from the original 140 x 110 mm. Originality/value The proposed EHMP-DLP scheme enables 3D printing of large-size objects with linearly increasing printing times and high printing precision. A device was established using two projectors to practice the scheme and can easily be extended to larger sizes by using more projectors.

关键词:

Large-size 3D printing EHMP-DLP Multi-projector DLP with energy homogenization Digital modulation Ultraviolet energy Mask projection

作者机构:

  • [ 1 ] [Wu, Lifang]Beijing Univ Technol, Beijing, Peoples R China
  • [ 2 ] [Zhao, Lidong]Beijing Univ Technol, Beijing, Peoples R China
  • [ 3 ] [Jian, Meng]Beijing Univ Technol, Beijing, Peoples R China
  • [ 4 ] [Mao, Yuxin]Beijing Univ Technol, Beijing, Peoples R China
  • [ 5 ] [Yu, Miao]Beijing Univ Technol, Beijing, Peoples R China
  • [ 6 ] [Guo, Xiaohua]Beijing Univ Technol, Beijing, Peoples R China

通讯作者信息:

  • [Jian, Meng]Beijing Univ Technol, Beijing, Peoples R China

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来源 :

RAPID PROTOTYPING JOURNAL

ISSN: 1355-2546

年份: 2018

期: 9

卷: 24

页码: 1500-1510

3 . 9 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:156

被引次数:

WoS核心集被引频次: 36

SCOPUS被引频次: 41

ESI高被引论文在榜: 0 展开所有

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