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Author:

Wang, Shaoliang (Wang, Shaoliang.) | Gou, Xianfang (Gou, Xianfang.) | Zhou, Su (Zhou, Su.) | Huang, Junlin (Huang, Junlin.) | Huang, Qingsong (Huang, Qingsong.) | Qiu, Jialiang (Qiu, Jialiang.) | Xu, Zheng (Xu, Zheng.) | Shen, Honglie (Shen, Honglie.)

Indexed by:

Scopus SCIE

Abstract:

We report industrial fabrication of different kinds of nanostructured multicrystalline silicon solar cells via normal acid texturing, reactive ion etching (RIE), and metal-assisted chemical etching (MACE) processes on diamond wire sawing wafer. The effect of different surface structure on reflectivity, lifetime, and electrical performance was systematically studied in this paper. The difference between industrial acid, RIE, and MACE textured multicrystalline silicon solar cells to our knowledge has not been investigated previously. The resulting efficiency indicates that low reflectivity surface structure with the size of 0.2-0.8 mu m via RIE and MACE process do not always lead to low lifetime compared with acid texturing process. Both RIE and MACE process is promising candidate for high efficiency processes for future industrial diamond wire sawing multicrystalline silicon solar cells.

Keyword:

Author Community:

  • [ 1 ] [Wang, Shaoliang]Beijing Jiaotong Univ, Inst Optoelect Technol, Beijing 100044, Peoples R China
  • [ 2 ] [Xu, Zheng]Beijing Jiaotong Univ, Inst Optoelect Technol, Beijing 100044, Peoples R China
  • [ 3 ] [Gou, Xianfang]CECEP Solar Energy Technol Zhenjiang Co Ltd, Zhenjiang 212132, Peoples R China
  • [ 4 ] [Zhou, Su]CECEP Solar Energy Technol Zhenjiang Co Ltd, Zhenjiang 212132, Peoples R China
  • [ 5 ] [Huang, Junlin]CECEP Solar Energy Technol Zhenjiang Co Ltd, Zhenjiang 212132, Peoples R China
  • [ 6 ] [Huang, Qingsong]CECEP Solar Energy Technol Zhenjiang Co Ltd, Zhenjiang 212132, Peoples R China
  • [ 7 ] [Qiu, Jialiang]CECEP Solar Energy Technol Zhenjiang Co Ltd, Zhenjiang 212132, Peoples R China
  • [ 8 ] [Gou, Xianfang]Beijing Univ Technol, Beijing 100124, Peoples R China
  • [ 9 ] [Zhou, Su]Nanjing Univ Aeronaut & Astronaut, Nanjing 211106, Jiangsu, Peoples R China
  • [ 10 ] [Huang, Junlin]Nanjing Univ Aeronaut & Astronaut, Nanjing 211106, Jiangsu, Peoples R China
  • [ 11 ] [Shen, Honglie]Nanjing Univ Aeronaut & Astronaut, Nanjing 211106, Jiangsu, Peoples R China

Reprint Author's Address:

  • [Xu, Zheng]Beijing Jiaotong Univ, Inst Optoelect Technol, Beijing 100044, Peoples R China;;[Zhou, Su]CECEP Solar Energy Technol Zhenjiang Co Ltd, Zhenjiang 212132, Peoples R China;;[Zhou, Su]Nanjing Univ Aeronaut & Astronaut, Nanjing 211106, Jiangsu, Peoples R China

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Source :

INTERNATIONAL JOURNAL OF PHOTOENERGY

ISSN: 1110-662X

Year: 2018

Volume: 2018

3 . 2 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:145

JCR Journal Grade:3

Cited Count:

WoS CC Cited Count: 6

SCOPUS Cited Count: 8

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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