• 综合
  • 标题
  • 关键词
  • 摘要
  • 学者
  • 期刊-刊名
  • 期刊-ISSN
  • 会议名称
搜索

作者:

Zhu Yan-Xu (Zhu Yan-Xu.) | Song Hui-Hui (Song Hui-Hui.) | Wang Yue-Hua (Wang Yue-Hua.) | Li Lai-Long (Li Lai-Long.) | Shi Dong (Shi Dong.)

收录:

EI Scopus SCIE PKU CSCD

摘要:

Gallium nitride (GaN) and its family of materials (including GaN, InN, AlN and their alloys) are known as the third generation of semiconductor, which has important applications in optoelectronics and microelectronics. In the structure of GaN-based high electron mobility transistor (HEMT) device, there is a relatively large conduction band offset in the AlGaN/GaN heterojunction structure, and it can produce a strong spontaneous and piezoelectric polarization effect in the vicinity of the heterojunction, which can also accumulate high concentrations of two-dimensional electron gas (2DEG) under the condition of no need of intentionally doping at the interface. The surface of Heterojunction AlGaN/GaN interface will form a 2DEG channel, and the 2DEG in potential well is controlled by the gate voltage, also the 2DEG layer is very close to the surface, which is sensitive to the state of the surface. When the surface state changes, it can cause a change in the 2DEG density, thus the concentration of 2DEG can be adjusted by changing the surface states, thereby changing the current between the source and drain. GaN-based HEMT serves as a gate control device, which has a high concentration of 2DEG and is sensitive to the surface state at the AlGaN/GaN heterojunction. According to the basic structure and advantages of the GaN-based HEMT device, the ferroelectric thin film PZT is deposited on the metal gate serving as a light sensitive layer. When the light is incident on the gate, the photo-sensing layer PZT generates the photovoltaic effect, which causes the surface charge of the photosensitive layer to change, and also causes the 2DEG to change, so the input current changes. In this paper, firstly, a new "M/F/M/S" structure is proposed by introducing a photosensitive material PZT on a GaN-based HEMT gate electrode and combining the PZT of a ferroelectric thin film with photovoltaic effect. Secondly, the HEMT device is fabricated on the AlGaN/GaN epitaxial wafer of sapphire substrate, and the photosensitive unit PZT is prepared on the gate, and thus the HEMT device with photosensitive is realized. Finally, the carrier concentration in the channel is regulated by the photovoltaic effect of PZT and 365 nm UV and visible light are detected through changing the source-drain current. The comparative tests under the conditions with and without a photosensitive gate HEMT device show that when the voltage V-gs is smaller, the saturation drain-source current I-ds measured under the irradiation of visible light in the former condition is not reduced compared with that in the latter condition, and the increment of I-ds measured in the former condition is 5.2 mA larger than in the latter condition. Therefore it can be seen that the PZT can act on the gate GaN-based HEMT device under the irradiation of visible and ultraviolet light and adjust the channel current.

关键词:

high electron mobility transistor lead zirconate titanate light detection photo-sensitive grid

作者机构:

  • [ 1 ] [Zhu Yan-Xu]Beijing Univ Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 2 ] [Song Hui-Hui]Beijing Univ Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 3 ] [Wang Yue-Hua]Beijing Univ Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 4 ] [Li Lai-Long]Beijing Univ Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 5 ] [Shi Dong]Beijing Univ Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China

通讯作者信息:

  • [Zhu Yan-Xu]Beijing Univ Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China

电子邮件地址:

查看成果更多字段

相关关键词:

来源 :

ACTA PHYSICA SINICA

ISSN: 1000-3290

年份: 2017

期: 24

卷: 66

1 . 0 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:94

中科院分区:4

被引次数:

WoS核心集被引频次: 1

SCOPUS被引频次: 2

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

近30日浏览量: 2

归属院系:

在线人数/总访问数:4059/2929571
地址:北京工业大学图书馆(北京市朝阳区平乐园100号 邮编:100124) 联系我们:010-67392185
版权所有:北京工业大学图书馆 站点建设与维护:北京爱琴海乐之技术有限公司