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作者:

Liu, Xia (Liu, Xia.) | Yang, Qingsheng (Yang, Qingsheng.) (学者:杨庆生)

收录:

EI Scopus SCIE

摘要:

Chemical oxidation of graphite and subsequent exfoliation allow the large-scale production of isolated graphene oxide (GO), in which the induced oxygen-containing functional groups on GO surface were then removed by means of reduction processes. The residual functional groups including carbonyl, hydroxyl and epoxy groups as well as the newly formed defects, significantly influence the physical properties of reduced GO (RGO). Here, RGO structures were generated through a thermal reduction process of GO using molecular dynamics simulations, in which the transformation of functional groups and the formation of non-hexagonal rings/defects were captured. The results suggested the formation of two RGO structures with different contents of functional groups at C/O ratios of about 11 and 13. These structures were obtained using various durations of the thermal reduction process. The dependence of tensile behaviour of RGOs on the structure and chirality as well as the influence of temperature on the tensile properties of RGOs were also evaluated. It was found that the strength and Young's modulus of RGOs decreased as a result of the residual functional groups and newly formed defects, and were decreased with the environment temperature.

关键词:

isolated graphene oxide graphene exfoliation RGO Young's modulus chirality molecular dynamic simulation tensile properties oxidation reduction (chemical) CO mechanical behaviour thermal reduction method graphite tensile strength molecular dynamics method chemical oxidation

作者机构:

  • [ 1 ] [Liu, Xia]Beijing Univ Technol, Dept Mech Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Yang, Qingsheng]Beijing Univ Technol, Dept Mech Engn, Beijing 100124, Peoples R China

通讯作者信息:

  • [Liu, Xia]Beijing Univ Technol, Dept Mech Engn, Beijing 100124, Peoples R China

电子邮件地址:

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来源 :

MICRO & NANO LETTERS

ISSN: 1750-0443

年份: 2017

期: 9

卷: 12

页码: 638-642

1 . 3 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:158

中科院分区:4

被引次数:

WoS核心集被引频次: 7

SCOPUS被引频次: 8

ESI高被引论文在榜: 0 展开所有

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