Grating　structures　of　gold　nanowires　with　a　width　of　sub-100　nm　and　a　total　area　in　the　order　of　square　centimeters　are　prepared　using　interference　lithography　and　colloidal　gold　nanoparticles.　In　the　fabrication,　photoresist　is　firstly　spin-coated　onto　the　glass　substrate　that　is　coated　with　a　layer　of　indium　tin　oxide　as　thick　as　200　nm.　Grating　structures　are　then　produced　by　interference　lithography　into　the　photoresist.　Through　controlling　the　exposure　dose　and　the　development　time,　small　duty　cycles　are　achieved　with　the　photoresist　gratings.　Thereafter,　colloidal　gold　nanoparticles　are　spin-coated　onto　the　photoresist　master　grating.　Making　use　of　the　dewetting　properties　of　the　colloidal　solution　on　the　photoresist　surface,　very　limited　amount　of　gold　nanoparticles　remain　on　the　photoresist　grating　and　are　confined　into　the　grating　grooves.　In　combination　with　the　small　duty　cycle　of　the　photoresist　grating　structures,　this　mechanism　enables　realization　of　narrow　gold　nanowires.　In　the　final　stage　of　the　fabrication,　the　sample　is　heated　to　250°C　for　about　5　minutes.　Gold-nanowire　gratings　with　a　duty　cycle　of　1:4　and　a　period　of　400　nm　are　achieved,　which　have　an　effective　area　of　1　cm　2.　The　optical　response　featured　with　strong　coupling　between　the　waveguide　resonance　mode　and　particle　plasmon　resonance　confirms　the　successful　fabrication　of　the　waveguided　metallic　photonic　crystals.　This　device　may　be　utilized　as　the　central　part　of　the　biosensors　with　small　sensing　volumes.