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作者:

Liao, Zhiheng (Liao, Zhiheng.) | Guo, Chunsheng (Guo, Chunsheng.) | Meng, Ju (Meng, Ju.) | Jiang, Boyang (Jiang, Boyang.) | Gao, Li (Gao, Li.) | Su, Ya (Su, Ya.) | Wang, Ruomin (Wang, Ruomin.) | Feng, Shiwei (Feng, Shiwei.) (学者:冯士维)

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EI Scopus SCIE

摘要:

By using scanning electron microscopy (SEM) and infrared data, we established and verified a two-dimensional finite-element model conforming to the size of the practical device to study high-electron-mobility transistors (HEMTs). Because the resolution of the infrared measurement was 7 mu m, we verified the correctness of the model by comparing the 7-mu m average peak temperature with the measured infrared data at various platform temperatures. The simulated average peak temperature agrees well with the infrared data. To further investigate the thermal performance of GaN-based HEMTs with various layer sizes and structural parameters, we simulated devices with various values of gate length, gate spacing, GaN layer thickness, substrate breadth, and substrate thickness. The conclusions presented result from some factors that must be taken into account to manage thermal issues in devices. (C) 2017 Elsevier Ltd. All rights reserved.

关键词:

Finite-element analysis GaN High-electron-mobility transistors (HEMTs) Thermal simulation

作者机构:

  • [ 1 ] [Liao, Zhiheng]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 2 ] [Guo, Chunsheng]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 3 ] [Meng, Ju]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 4 ] [Jiang, Boyang]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 5 ] [Su, Ya]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 6 ] [Wang, Ruomin]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 7 ] [Feng, Shiwei]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 8 ] [Gao, Li]China Elect Standardizat Inst, Beijing 100176, Peoples R China

通讯作者信息:

  • [Liao, Zhiheng]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China

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来源 :

MICROELECTRONICS RELIABILITY

ISSN: 0026-2714

年份: 2017

卷: 74

页码: 52-57

1 . 6 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:92

中科院分区:4

被引次数:

WoS核心集被引频次: 7

SCOPUS被引频次: 7

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

近30日浏览量: 2

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