Optical　floating　zone　(OFZ)　is　one　of　the　most　extensively　used　techniques　to　grow　a　variety　of　bulk　crystals,　especially　single　crystals　of　metal　oxides.　Although　the　growth　parameters　have　been　identified　to　be　the　nature　of　feed　rod,　lamp　power,　rotation　rate,　growth　atmosphere　and　gas　pressure,　etc.,　few　studies　revealed　the　effects　of　these　parameters　on　temperature　field　during　crystal　growth　in　image　furnaces.　It　is　well　known　that　the　temperature　gradient　is　the　driving　force　for　float　zone　crystal　growth.　Therefore,　it　is　essential　to　obtain　the　major　growth　parameters　affecting　OFZ　temperature　field.　In　this　work,　a　simplified　finite　element　(FE)　model　was　developed　for　numerical　simulation　of　temperature　field　during　OFZ　crystal　growth.　The　effects　of　major　growth　parameters　(i.e.　lamp　power,　lamp　filament,　and　molten　zone　geometry)　on　temperature　field　during　OFZ　crystal　growth　were　hence　identified　theoretically　and　validated　experimentally.　According　to　the　numerical　calculation,　the　growth　parameters　were　optimized　and　high-quality　TiO2　single　crystal　was　grown　in　practice.　Prospectively,　the　FE　model　presented　in　this　work　can　be　applied　to　optimize　growth　parameters　for　other　crystals　as　well　as　opens　up　new　opportunities　to　understand　the　physical　process　of　OFZ　crystal　growth　in　a　simple　and　scientific　way.