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作者:

Wang, B. B. (Wang, B. B..) | Qu, X. L. (Qu, X. L..) | Zheng, K. (Zheng, K..) (学者:郑坤) | Levchenko, I. (Levchenko, I..) | Keidar, M. (Keidar, M..) | Zhu, M. K. (Zhu, M. K..) | Xu, S. (Xu, S..) (学者:徐硕) | Ostrikov, K. (Ostrikov, K..)

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EI Scopus SCIE

摘要:

C and O doped BN nanoflakes and hybrid nanoflake-nanowire structures were synthesized in N-2+H-2 environment using plasma-enhanced hot filament chemical vapour deposition with solid B4C as boron and carbon precursor. Structure and chemical composition of the C and O doped BN nanoflakes and hybrid nanoflake-nanowire hybrid structures were systemically studied using advanced characterization instruments including high resolution transmission electron microscope, micro-Raman spectroscope, Fourier transform infrared spectroscope, X-ray diffractometer, field emission scanning electron microscope, and X-ray photoelectron spectroscope. The obtained results evidence that the C and O doped BN nanowires nucleate and grow directly on the tops of C and O doped BN nanoflakes due to the presence of dangling bonds on the surfaces of tips of C and O doped BN nanoflakes, which were formed by the ion bombardment in plasma. The photoluminescence ( PL) properties of C and O doped BN nanoflakes and C and O doped BN nanoflake-nanowire hybrid structures were studied at room temperature using a micro-Raman system with the 325 nm line of He-Cd laser as the excitation source. The results of PL measurements indicate that the PL properties of C and O doped BN nanoflake-nanowire hybrid structures significantly change with the length of C and O doped BN nanostructures due to the interface zones caused by the nanowire length. Thus, the PL properties can be efficiently tuned by the length of nanowires. These achievements can contribute to the synthesis of novel BN-based hybrid nanostructures and the development of the next generation BN-based optoelectronic nanodevices. (C) 2017 Elsevier B.V. All rights reserved.

关键词:

C and O doped BN nanoflake-nanowire hybrid structures Photoluminescence Plasma Chemical vapour deposition

作者机构:

  • [ 1 ] [Wang, B. B.]Chongqing Univ Technol, Coll Chem & Chem Engn, 69 Hongguang Rd, Chongqing 400054, Peoples R China
  • [ 2 ] [Qu, X. L.]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 3 ] [Zheng, K.]Beijing Univ Technol, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 4 ] [Levchenko, I.]Nanyang Technol Univ, Natl Inst Educ, Plasma Sources & Applicat Ctr, 1 Nanyang Walks, Singapore 637616, Singapore
  • [ 5 ] [Xu, S.]Nanyang Technol Univ, Natl Inst Educ, Plasma Sources & Applicat Ctr, 1 Nanyang Walks, Singapore 637616, Singapore
  • [ 6 ] [Levchenko, I.]Queensland Univ Technol, Sch Chem Phys & Mech Engn, Brisbane, Qld 4000, Australia
  • [ 7 ] [Ostrikov, K.]Queensland Univ Technol, Sch Chem Phys & Mech Engn, Brisbane, Qld 4000, Australia
  • [ 8 ] [Keidar, M.]George Washington Univ, Mech & Aerosp Engn, Washington, DC 20052 USA
  • [ 9 ] [Zhu, M. K.]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 10 ] [Ostrikov, K.]CSIRO, CSIRO QUT Joint Sustainable Proc & Devices Lab, POB 218, Lindfield, NSW 2070, Australia
  • [ 11 ] [Ostrikov, K.]Univ Sydney, Sch Phys, Plasma Nanosci, Sydney, NSW 2006, Australia

通讯作者信息:

  • [Wang, B. B.]Chongqing Univ Technol, Coll Chem & Chem Engn, 69 Hongguang Rd, Chongqing 400054, Peoples R China

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来源 :

JOURNAL OF ALLOYS AND COMPOUNDS

ISSN: 0925-8388

年份: 2017

卷: 705

页码: 691-699

6 . 2 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:287

中科院分区:1

被引次数:

WoS核心集被引频次: 15

SCOPUS被引频次: 15

ESI高被引论文在榜: 0 展开所有

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