Shrinkage deformation research of photosensitive resin in mask projection stereolithography - 文章详情页

作者：

Huang, K. (Huang, K..) | Chen, J.-M. (Chen, J.-M..) (学者：陈继民) | Fang, H.-B. (Fang, H.-B..) | Yuan, Y.-P. (Yuan, Y.-P..)

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Scopus PKU CSCD

摘要：

The　aim　of　this　research　is　to　analyze　the　influence　of　shrinkage　behavior　on　the　deformation　of　forming　parts　in　mask　projection　stereolithography.　A　mask　projection　stereolithography　machine　based　on　DLP　(digital　light　procession)　technology　was　designed,　and　the　shrinkage　of　photosensitive　resin　during　light-cured　process　was　analyzed.　The　shrinkage　behavior　of　resin　in　different　exposure　situations,　free-surface　and　constrain-surface,　and　also　in　secondary　curing　process　was　studied.　The　result　shows　that　in　free-surface,　the　shrinkage　of　B5B　type　resin　is　proportional　to　the　exposure　time,　eventually　it　stabilizes　at　around　4%.　When　it　is　in　constrain-surface,　the　overflowed　light　curing　effect　leads　to　shrinkage　which　decreases　with　exposure　time　increased,　and　the　shrinkage　generated　in　the　secondary　curing　process　accounts　for　40%~50%　of　total.　©　2015,　Beijing　University　of　Technology.　All　right　reserved.

关键词：

Mask projection stereolithography; Rapid prototyping; Secondary curing process; Shrinkage deformation

作者机构：

[ 1 ] [Huang, K.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
[ 2 ] [Chen, J.-M.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
[ 3 ] [Fang, H.-B.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
[ 4 ] [Yuan, Y.-P.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China

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