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Author:

Huang, K. (Huang, K..) | Chen, J.-M. (Chen, J.-M..) (Scholars:陈继民) | Fang, H.-B. (Fang, H.-B..) | Yuan, Y.-P. (Yuan, Y.-P..)

Indexed by:

Scopus PKU CSCD

Abstract:

The aim of this research is to analyze the influence of shrinkage behavior on the deformation of forming parts in mask projection stereolithography. A mask projection stereolithography machine based on DLP (digital light procession) technology was designed, and the shrinkage of photosensitive resin during light-cured process was analyzed. The shrinkage behavior of resin in different exposure situations, free-surface and constrain-surface, and also in secondary curing process was studied. The result shows that in free-surface, the shrinkage of B5B type resin is proportional to the exposure time, eventually it stabilizes at around 4%. When it is in constrain-surface, the overflowed light curing effect leads to shrinkage which decreases with exposure time increased, and the shrinkage generated in the secondary curing process accounts for 40%~50% of total. © 2015, Beijing University of Technology. All right reserved.

Keyword:

Mask projection stereolithography; Rapid prototyping; Secondary curing process; Shrinkage deformation

Author Community:

  • [ 1 ] [Huang, K.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 2 ] [Chen, J.-M.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 3 ] [Fang, H.-B.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 4 ] [Yuan, Y.-P.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China

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Source :

Journal of Beijing University of Technology

ISSN: 0254-0037

Year: 2015

Issue: 12

Volume: 41

Page: 1828-1831

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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