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作者:

Zheng, Xiang (Zheng, Xiang.) | Feng, Shiwei (Feng, Shiwei.) (学者:冯士维) | Zhang, Yamin (Zhang, Yamin.) | He, Xin (He, Xin.) | Wang, Yu (Wang, Yu.)

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摘要:

The reliability of GaN high-electron-mobility transistors remains limited by trapping, and a new way to characterize traps is through the drain current transient. In this paper, we report a differential amplitude spectrum (DAS) from which we could extract the exact amount that a trap contributes to charging/discharging from the current transient. We compared the time constant spectrum and the DAS in extracting traps' amplitudes theoretically and experimentally. Using the DAS, we investigated the trapping effect and systematically identified the positions and mechanisms of traps with Ea values of 0.10, 0.38, 0.45, and 0.61 eV in our samples. In particular, we demonstrated that the semi-oN state with high-drain voltage in the filling process can maximize the charge trapping in both the AIGaN layer and GaN buffer. In addition, we experimentally proved that measured voltage in the linear region was the best choice for these samples.

关键词:

different amplitude spectrum (DAS) high-electron-mobility transistor (HEMT) Current transient GaN trapping effect

作者机构:

  • [ 1 ] [Zheng, Xiang]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 2 ] [Feng, Shiwei]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 3 ] [Zhang, Yamin]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 4 ] [He, Xin]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 5 ] [Wang, Yu]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China

通讯作者信息:

  • 冯士维

    [Feng, Shiwei]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China

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来源 :

IEEE TRANSACTIONS ON ELECTRON DEVICES

ISSN: 0018-9383

年份: 2017

期: 4

卷: 64

页码: 1498-1504

3 . 1 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:165

中科院分区:3

被引次数:

WoS核心集被引频次: 34

SCOPUS被引频次: 36

ESI高被引论文在榜: 0 展开所有

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中文被引频次:

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