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作者:

Lü, W. (Lü, W..) | Li, D.-B. (Li, D.-B..) | Zhang, Z.-Y. (Zhang, Z.-Y..) | Li, C.-R. (Li, C.-R..) | Zhang, Z. (Zhang, Z..) | Xu, B. (Xu, B..) | Wang, Z.-G. (Wang, Z.-G..)

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摘要:

Effects of rapid thermal annealing on the optical and structural properties of self-assembled InAs/GaAs quantum dots capped by the InAlAs/InGaAs combination layers are studied by photoluminescence and transmission electron microscopy. The photoluminescence measurement shows that the photoluminescence peak of the sample after 850°C rapid thermal annealing is blue shifted with 370 meV and the excitation peak intensity increases by a factor of about 2.7 after the rapid thermal annealing, which indicates that the InAs quantum dots have experienced an abnormal transformation during the annealing. The transmission electron microscopy shows that the quantum dots disappear and a new InAlGaAs single quantum well structure forms after the rapid thermal annealing treatment. The transformation mechanism is discussed. These abnormal optical properties are attributed to the structural transformation of these quantum dots into a single quantum well. © 2005 Chinese Physical Society and IOP Publishing Ltd.

关键词:

作者机构:

  • [ 1 ] [Lü, W.]Beijing Laboratory of Electron Microscopy, Institute of Physics, Chinese Academy of Sciences, PO Box 603, Beijing 100080, China
  • [ 2 ] [Lü, W.]Department of Materials Science, College of Materials Science and Engineering, Jilin University, Changchun 130012, China
  • [ 3 ] [Li, D.-B.]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083, China
  • [ 4 ] [Zhang, Z.-Y.]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083, China
  • [ 5 ] [Li, C.-R.]Beijing Laboratory of Electron Microscopy, Institute of Physics, Chinese Academy of Sciences, PO Box 603, Beijing 100080, China
  • [ 6 ] [Zhang, Z.]Beijing University of Technology, Beijing 100022, China
  • [ 7 ] [Xu, B.]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083, China
  • [ 8 ] [Wang, Z.-G.]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083, China

通讯作者信息:

  • [Lü, W.]Beijing Laboratory of Electron Microscopy, Institute of Physics, Chinese Academy of Sciences, PO Box 603, Beijing 100080, China

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来源 :

Chinese Physics Letters

ISSN: 0256-307X

年份: 2005

期: 4

卷: 22

页码: 967-970

3 . 5 0 0

JCR@2022

ESI学科: PHYSICS;

JCR分区:2

被引次数:

WoS核心集被引频次: 0

SCOPUS被引频次: 3

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

近30日浏览量: 3

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