Textured characteristic of aluminum nitride films prepared by magnetron sputtering - 文章详情页

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Scopus

摘要：

The　oriented　AlN　films　on　Si　(100)　substrates　were　prepared　by　reactive　magnetron　sputtering　and　were　characterized　by　XRD　spectra.　It　was　observed　that　with　decreasing　in　the　sputtering　pressure,　the　c-axis　orientation　of　hexagonal　AlN　grains　in　the　films　varies　from　paralleling　with　to　perpendicular　to　the　surface　of　the　substrates.　From　the　images　of　atomic　force　microscopy,　the　AlN　grains　were　found　having　a　silkworm-like　shape　and　the　long　axis　was　the　c-axis　of　the　hexagonal　AlN.

关键词：

Aluminum nitride; Film; Magnetron sputtering; Orientation

作者机构：

[ 1 ] [Wang, B.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China
[ 2 ] [Wang, R.Z.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China
[ 3 ] [Wang, M.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China
[ 4 ] [Huang, A.P.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China
[ 5 ] [Li, X.H.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China
[ 6 ] [Zhu, M.K.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China
[ 7 ] [Yan, H.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China

通讯作者信息：

王波
[Wang, B.]Key Lab. of Adv. Funct. Materials, China Education Ministry, Beijing Polytechnic University, Beijing 100022, China

电子邮件地址：

wangbo@bjpu.edu.cn

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