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作者:

Yang, Q. (Yang, Q..) | Ji, L. (Ji, L..) (学者:嵇灵) | Xu, B. (Xu, B..) | Yan, T. (Yan, T..) | Wang, W. (Wang, W..) (学者:王伟) | Lin, Z. (Lin, Z..)

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摘要:

Large-scale periodic dot matrix anti-reflective microstructures were fabricated on the surface by using UV picosecond laser with rapid line scanning to improve the infrared transmittance of As2Se3 glass. In the study, the laser ablation threshold of As2Se3 glass was concluded and the optimal line scanning method was designed. The transmittance of the fabricated chalcogenide glass increased about 10.0 % and 5.2% in wavelength ranged from 11.0 μm~12.4 μm and 13.0 μm~14.2 μm, respectively. In addition, the wettability of the glass was not damaged by laser scanning. The processing was carried out in air condition showing low cost, high controllability and high efficiency. It only took 3.65 s to finish the fabrication of 8 mm×8 mm surface structures. Both the size and space of the surface microstructure unit can be controlled according to the application requirement. The removal of the chalcogenide glass induced by laser was mainly based on "cold fabrication" in which no obvious thermal effects inducing the element change on the surface were observed. Higher laser energy could induce obvious thermal effect resulting in melting of the ablation points and bump of the crater edges. © 2017, Editorial Office of Opto-Electronic Engineering. All right reserved.

关键词:

Antireflection; As2Se3 chalcogenide glass; Contact angle; Picosecond laser; Surface micro-structure

作者机构:

  • [ 1 ] [Yang, Q.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 2 ] [Ji, L.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 3 ] [Xu, B.]China Building Materials Academy, Beijing, 100024, China
  • [ 4 ] [Yan, T.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 5 ] [Wang, W.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China
  • [ 6 ] [Lin, Z.]Institute of Laser Engineering, Beijing University of Technology, Beijing, 100124, China

通讯作者信息:

  • 嵇灵

    [Ji, L.]Institute of Laser Engineering, Beijing University of TechnologyChina

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来源 :

Opto-Electronic Engineering

ISSN: 1003-501X

年份: 2017

期: 12

卷: 44

页码: 1200-1209

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WoS核心集被引频次: 0

SCOPUS被引频次: 4

ESI高被引论文在榜: 0 展开所有

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